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US 5,399,185 AGranted
Process for producing a phosphor layer by reacting a doped substance with silica
AssigneeSiemens Aktiengesellschaft
InventorsThomas Berthold, Christa Grabmaier
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Abstract
A doped starting substance is applied to a substrate composed of SiO.sub.2 glass. A phosphor layer is formed by reaction of the starting substance with SiO.sub.2 of the substrate to form a silicate of the starting substance. This reaction is carried out in a heat-treatment process in an oxygen-containing atmosphere. Zn or Gd is preferably used as starting substance.
Claims11
A process for producing a phosphor layer on a substrate comprising the steps of:
- applying a first layer composed of a starting substance doped with a dopant on a SiO.sub.2 glass substrate;
- and
- producing a phosphor layer by reaction of said starting substance with the SiO.sub.2 of the substrate to form a silicate of said starting substance by heat treatment at a reaction temperature in an oxygen-containing atmosphere, said SiO.sub.2 glass substrate having a softening point above said reaction temperature.
Dependencies are inferred from the claim text.