Organosilicon compounds and their use in film-forming compositions
AssigneeDow Corning Corporation
InventorsJames McVie, Martin Rowlands
Life of this patent
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Abstract
Novel neopentasiloxane compounds of the general formula Si[OSiR.sub.2 Q].sub.4 wherein R denotes a monovalent hydrocarbon or halohydrocarbon group and Q denotes a group R or a group comprising a block of at least two oxyalkylene units and having a terminal group containing a reactive hydrogen atom, not more than one Q denoting an R group. The invention also encompasses a film-forming composition comprising a curable polyurethane resin and the neopentasiloxane, and the use of the film-forming compositions to provide breathable (water vapour permeable) coatings on textile fabrics.
Claims8
An organosilicon compound represented by the general formula Si[OSiR.sub.2 Q].sub.4 wherein R denotes a monovalent group having from 1 to 8 carbon atoms and free of aliphatic unsaturation, selected from hydrocarbon and halogen-substituted hydrocarbon groups and Q denotes a group R or a group comprising a block of at least two oxyalkylene units and having a terminal group containing a reactive hydrogen atom, provided that not more than one Q group in the molecule denotes an R group.
A method of treating a substrate which comprises applying thereto a film-forming resin which comprises 100 parts by weight of a curable polyurethane resin and from 10 to 100 parts by weight of an organosilicon compound represented by the general formula Si[OSiR.sub.2 Q].sub.4 wherein R denotes a monovalent group having from 1 to 8 carbon atoms and free of aliphatic unsaturation, selected from hydrocarbon and halogen-substituted hydrocarbon groups and Q denotes a group R or a group of the general formula --C.sub.s H.sub.2s [OC.sub.2 H.sub.4 ].sub.n [OC.sub.3 H.sub.6 ].sub.m OH, wherein s is an integer of from 3 to 6, n is an integer of from 5 to 100 and m is zero or an integer of from 1 to 80, provided that n>m, and that no more than one Q group denotes a group R, and curing the applied composition.
A method of treating a substrate which comprises forming a self-supporting film from a film-forming resin which comprises 100 parts by weight of a curable polyurethane resin and from 10 to 100 parts by weight of an organosilicon compound represented by the general formula Si[OSiR.sub.2 Q].sub.4 wherein R denotes a monovalent group having from 1 to 8 carbon atoms and free of aliphatic unsaturation, selected from hydrocarbon and halogen-substituted hydrocarbon groups and Q denotes a group R or a group of the general formula--C.sub.s H2.sub.s [OC.sub.2 H.sub.4 ].sub.n [OC.sub.3 H.sub.6 ].sub.m OH, wherein s is an integer of from 3 to 6, n is an integer of from 5 to 100 and m is zero or an integer of from 1 to 80, provided that n>m and that no more than one Q group denotes a group R, and thereafter laminating said film to said substrate.
Dependencies are inferred from the claim text.