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US 5,397,679 AGranted
Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
AssigneeSumitomo Chemical Company, Limited
InventorsYuji Ueda, Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto
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Abstract
This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
Claims14
A positive photoresist composition comprising:
- a cyclic carbonate compound represented by general formula (I):
- ##STR18## wherein R.sub.1 to R.sub.9 independently of one another each represent a hydrogen atom, a halogen atom, an optionally substituted straight chain or branched chain alkyl or alkenyl group, a t-butoxycarbonyloxy group or an acetyl group;
- provided that at least one of R.sub.1 to R.sub.4 is a t-butoxycarbonyloxy group and at least one of R.sub.5 to R.sub.9 is a t-butoxycarbonyloxy group;
- an alkali-soluble resin;
- and
- a photo-induced acid precursor.
3 more elements
Dependencies are inferred from the claim text.