Back to results
US 5,397,644 AGranted
Magnetic disk having a sputtered hydrogen-doped carbon protective film
AssigneeKomag, Inc.
InventorTsutomu T. Yamashita
Life of this patent
Estimating the term…
Abstract
A carbon film for protecting a magnetic disk is sputtered in the presence of hydrogen. If a sufficient amount of hydrogen is present in the sputtering chamber, the resulting carbon film will exhibit superior mechanical characteristics, i.e. an enhanced wear resistance during a contact-start-stop or drag test in a disk drive. Sputtering in the presence of hydrogen can be accomplished by either DC or RF magnetron sputtering, or DC or RF diode sputtering.
Claims11
A magnetic data storage device comprising:
- a layer of magnetic media;
- and
- only one carbon film formed on said layer of magnetic media, said carbon film having uniform morphology throughout and having predominantly SP2 bonding sputtered by RF diode, DC diode, RF magnetron or DC magnetron sputtering onto said media in the presence of a sufficient amount of gaseous molecules containing hydrogen to substantially enhance the mechanical wear resistance of said carbon film, said carbon film being substantially amorphous and wherein there is substantially no crystal phase material located within said carbon film, said carbon film being the upper-most vacuum-deposited layer on said magnetic data storage device, said carbon film having a hardness on the order of about 8 GPa and an elasticity less than or equal to about 92 GPa.
A magnetic data storage structure comprising:
- a layer of magnetic media;
- and
- only one carbon film formed on said layer of magnetic media, said carbon film having uniform morphology throughout sputtered by RF diode, DC diode, RF magnetron or DC magnetron sputtering onto said media from a sputtering target, said carbon film being substantially amorphous and wherein there is substantially no crystal phase material located within said carbon film, said carbon film having predominantly SP2 bonding, said carbon being sputtered from said sputtering target in the presence of a gas flow comprising molecules containing hydrogen such that the concentration of the molecules containing hydrogen in the vicinity of said sputtering target would be greater than or equal to about 15 percent if sputtering were not taking place, said carbon film being the upper-most vacuum-deposited layer on said magnetic data storage structure, wherein said carbon film has a hardness on the order of about 8 GPa and an elasticity less than or equal to about 92 GPa.
A magnetic memory comprising:
- a layer of magnetic media;
- and
- only one carbon film formed on said layer of magnetic media, said carbon film having uniform morphology throughout sputtered by RF diode, DC diode, RF magnetron or DC magnetron sputtering onto said media from a sputtering target, said carbon film being substantially amorphous wherein there is substantially no crystal phase material located within said carbon film, said carbon film having predominantly SP2 bonding, said carbon being sputtered from said sputtering target in the presence of a gas flow comprising molecules containing hydrogen such that the concentration of the molecules containing hydrogen in the vicinity of said sputtering target is greater than or equal to about 7.5% when sputtering is taking place, said carbon film being the upper-most vacuum-deposited layer on said magnetic memory, said carbon film having a hardness on the order of about 8 GPa and an elasticity less than or equal to about 92 GPa.
Dependencies are inferred from the claim text.