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US 5,397,448 AGranted
Device for generating a plasma by means of cathode sputtering and microwave-irradiation
AssigneeLeybold Aktiengesellschaft
InventorsRoland Gesche, Rudolf Latz
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Abstract
The invention relates to a device for generating a plasma by means of cathode sputtering and microwave irradiation. This device comprises a magnetron cathode over which is placed a microwave cavity resonator at the atmosphere side. At the vacuum side the device comprises laterally delimiting shielding sheets which on their inside are provided with a magnet which generates a magnetic field perpendicular to the surface of the target of the magnetron cathode.
Claims9
A device for generating a plasma by means of cathode sputtering and microwave irradiation, comprising
- a) a plasma chamber;
- b) a sputtering target in the plasma chamber connected via an electrode to a power supply;
- c) a magnetron magnet structure positioned behind the sputtering target whose magnetic field exits from the target and again enters it;
- d) a microwave transmitter which transmits microwaves via a waveguide into the region in front of the target, whereat parallel shielding sheets are provided opposite the target surface;
- and
- e) a magnet provided on the shielding sheets for generating a field which extends essentially perpendicular to the target.
3 more elements
Dependencies are inferred from the claim text.