Apparatus for chemical vapor deposition of diamond including thermal spreader
AssigneeGeneral Electric Company
InventorsPhilip G. Kosky, Erik O. Einset, David W. Woodruff
Life of this patent
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Abstract
Temperature uniformity and control in apparatus for chemical vapor deposition of diamond is improved by contacting the rear of the substrate assembly, which may be a substrate or a holder containing substrates, with a thermal spreader, preferably of copper and preferably having heating means embedded therein or associated therewith. The thermal spreader contacts a thermal resistance unit, preferably of stainless steel, which in turn is in contact with a cooling element that preferably has coolant passages therein.
Claims15
Apparatus for preparation of diamond by chemical vapor deposition, comprising:
- at least one heating filament;
- at least one substrate assembly including a substrate capable of receiving deposited diamond, said assembly having a front diamond-receiving side and a rear side;
- a thermal spreader of a metal having a thermal conductivity of at least about 0.5 W/cm.degree.C., said thermal spreader having a front side and a rear side and the front side thereof being in contact with said rear side of said substrate assembly;
- a thermal resistance unit of a material having a thermal conductivity of at most about 0.3 W/cm.degree.C., said thermal resistance unit having a front side and a rear side and the front side thereof being in contact with said rear side of said thermal spreader;
- and
- a cooling element in contact with said rear side of said thermal resistance unit, said cooling element being of a metal having a thermal conductivity of at least about 0.5 W/cm.degree.C.
Dependencies are inferred from the claim text.