Method for selective formation of a deposited film
AssigneeCanon Kabushiki Kaisha
InventorTakao Yonehara
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Abstract
A method for selective formation of a deposited film comprises forming selectively a deposited film of a desired pattern on a deposition surface comprising a plurality of different kinds of materials formed corresponding to said pattern and providing different nucleus forming densities to the deposited film forming material.
Claims4
A method for selective formation of a deposited film, which comprises providing on at least the bottom portion of a groove for element separation formed on a semiconductor substrate a material with higher nucleus forming density than the material constituting the surface portion of the periphery of the opening of said groove, thereby selectively depositing the deposited film forming material in said groove for element separation to fill said groove.
Dependencies are inferred from the claim text.