Photochemical cutting of fabrics
AssigneeThe United States of America as represented by the United States Department of Energy
InventorMartin S. Piltch
Life of this patent
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Abstract
Apparatus for the cutting of garment patterns from one or more layers of fabric. A laser capable of producing laser light at an ultraviolet wavelength is utilized to shine light through a pattern, such as a holographic phase filter, and through a lens onto the one or more layers of fabric. The ultraviolet laser light causes rapid photochemical decomposition of the one or more layers of fabric, but only along the pattern. The balance of the fabric of the one or more layers of fabric is undamaged.
Claims9
Apparatus for cutting a garment pattern from one or more layers of fabric comprising:
- a laser capable of producing ultraviolet light;
- pattern means in optical communication with said laser light, said pattern means defining pathways for said laser light in the shape of said garment pattern;
- lens means receiving said laser light in the shape of said garment pattern for focussing said laser light onto said one or more layers of fabric.
A method of cutting garment patterns from one or more layers of fabric comprising the steps of:
- shining ultraviolet light through a pathway defining said garment pattern;
- focussing said ultraviolet light shined through said pathway defining said garment pattern onto said one or more layers of fabric;
- wherein said garment pattern is cut into said one or more layers of fabric by photochemical decomposition.
Dependencies are inferred from the claim text.