Low particulate slit valve system and method for controlling same
AssigneeApplied Materials, Inc.
InventorD'Arcy H. Lorimer
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AssigneeApplied Materials, Inc.
InventorD'Arcy H. Lorimer
Estimating the term…
Low particulate slit valve system and method for controlling the closure pressure applied to a slit valve. An apparatus in accordance with the present invention includes a barrier having a slit valve aperture, a valve seat surrounding the aperture, a closure movable towards and away from the valve seat, a sensing mechanism for determining the pressure differential on the two sides of the barrier, a processing unit responsive to the pressure differential and operative to produce a control signal, and a valve actuator responsive to the control signal and operative to control the force applied to the closure. The method of the invention includes determining a first fluid pressure on a first side of the barrier, determining a second pressure on a second side of the barrier, and applying a closure pressure to the closure which is related to the pressure differential between the first fluid pressure and the second fluid pressure. If the pressure differential is low, zero or very near to zero pressure is applied to the closure to seal the aperture. If the pressure differential is high, a proportionately larger pressure is applied to the closure.
A method for controlling a closure pressure applied to a closure covering an aperture in a barrier having different fluid pressure on opposite sides of the barrier, comprising:
A method for controlling a closure pressure applied to a closure covering an aperture in a barrier, said closure having a face provided with an O-ring sealing member adapted to surround said aperture, said method comprising:
A variable closure pressure slit valve system for use in semiconductor processing chamber comprising:
Dependencies are inferred from the claim text.