Exposure apparatus including two illuminating systems and exposure process using the same
AssigneeCanon Kabushiki Kaisha
InventorJunji Isohata
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorJunji Isohata
Estimating the term…
Disclosed are an exposure apparatus and process, including a holding unit for holding first and second objects such as a mask and a substrate, a first illumination system for illuminating the first object with an exposure light, a projection optical system for forming an image of a portion such as a pattern portion of the first object illuminated with the exposure light onto the second object and a second illumination system for illuminating a portion such as peripheral portion of the second object held by the holding unit outside of a portion of the second object illuminated with the exposure light from the first illumination system. The exposure apparatus or process may further include a moving unit or step for moving the first and second objects as a unit relative to the projection optical system and a control unit or step for causing the moving unit to move the first and second objects as a unit relative to the projection optical system while causing the first illumination system and the second illumination system to illuminate the first object and the second object, respectively, so that the image of the pattern on the first object is tranferred onto the second object through the projection optical system.
An exposure apparatus for transferring a pattern on a first object onto a second object, said apparatus comprising:
An exposure process for transferring a pattern on a first object onto a second object, said process comprising the steps of:
An exposure apparatus comprising:
An exposure apparatus comprising:
A device manufacturing method comprising the steps of:
Dependencies are inferred from the claim text.