Excellent far-infrared radiating material
AssigneeSumitomo Metal Industries, Ltd.
InventorsTetsuaki Tsuda, Yasuhiro Yamamoto, Junichi Uchida, Hirohisa Seto, Kunihiro Fukui, Shinya Hikino
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Abstract
A material for producing far-infrared radiation is disclosed. The material comprises a substrate and an Al--Mn alloy-derived oxide surface layer on the substrate, the oxide surface layer being porous with an average pore diameter of 0.01-2.0 micrometers and a porosity of 10.sup.3 -10.sup.12 pores/cm.sup.2, the weight ratio of Mn/Al of the oxide surface layer being 0.001-2.0, and the thickness of the oxide surface layer being 0.1-100 micrometers.
Claims24
A material for producing far-infrared radiation comprising a substrate and an oxide surface layer derived from an Al--Mn alloy on the substrate, the oxide surface layer being porous with an average pore diameter of 0.01-2.0 micrometers and a porosity of 10.sup.3 -10.sup.12 pores/cm.sup.2, the weight ratio of Mn/Al of the oxide surface layer being 0.001-2.0, and the thickness of the oxide surface layer being 0.1-100 micrometers.
A far-infrared radiating article comprising a substrate and an oxide surface layer derived from an Al--Mn alloy formed on the substrate, the oxide surface layer being porous with an average pore diameter of 0.01-2.0 micrometers and a porosity of 10.sup.3 -10.sup.12 pores/cm.sup.2, the weight ratio of Mn/Al of the oxide surface layer being 0.001-2.0, and the thickness of the oxide surface layer being 0. 1-100 micrometers.
Dependencies are inferred from the claim text.