# US 5,353,296 A · Materials processing with a high repetition rate isotopic carbon dioxide laser > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,353,296 A - Document ID: US5353296A - Status: Granted - Kind: A - Application number: 08/090,410 - Filed: 1993-07-12 - Granted: 1994-10-04 - Earliest claimed: 1993-07-12 - Assignees: Coherent, Inc. - Inventors: Dale E. Koop - Web page: https://patentgrep.com/patent/US5353296A ## CPC - H01S 3/0975: using inductive or capacitive excitation - B23K 26/0604: {by a combination of beams} - B23K 26/0622: by shaping pulses - H01S 3/2232: {Carbon dioxide (CO2) or monoxide [CO]} - H01S: DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL - B23K: SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM ## Abstract An laser system is disclosed for materials processing. The system includes an RF excited, conduction cooled, sealed gas laser. The lasing species in the gas mixture is an isotope of carbon dioxide and in the preferred embodiment is defined by the .sup.13 CO.sub.2 isotope. The use of the .sup.13 CO.sub.2 isotope functions to shorten the rise and fall times of the laser pulses. By this arrangement, the laser may be operated at higher repetition rates with a full depth of power modulation. ## Claims ### Claim 1 A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz. ### Claim 2 (depends on 1) A laser as recited in claim 1 wherein the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species. ### Claim 3 (depends on 1) A laser as recited in claim 1 wherein said gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen. ### Claim 4 (depends on 1) A laser as recited in claim 1 wherein said gas mixture consists primarily of isotopic carbon dioxide, helium and xenon. ### Claim 5 (depends on 1) A laser as recited in claim 1 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 6 A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species. ### Claim 7 (depends on 6) A laser as recited in claim 6 wherein said gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen. ### Claim 8 (depends on 6) A laser as recited in claim 6 wherein said gas mixture consists primarily of isotopic carbon dioxide, helium and xenon. ### Claim 9 (depends on 6) A laser as recited in claim 6 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 10 (depends on 6) A laser as recited in claim 6 wherein the depth of modulation of said laser output is at least eighty percent at pulse repetition rates greater than 20 Khz. ### Claim 11 A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation between the output pulses; and means for directing the beam to the material to be processed. ### Claim 12 (depends on 11) A laser system as recited in claim 11 wherein said lasing gas is excited with an RF signal. ### Claim 13 (depends on 11) A laser system as recited in claim 11 wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen. ### Claim 14 (depends on 11) A laser system as recited in claim 11 wherein the gas in the sealed discharge laser is defined by a gas mixture wherein the gas mixture consists primarily of isotopic carbon dioxide, helium and xenon. ### Claim 15 (depends on 11) A laser system as recited in claim 11 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 16 (depends on 11) A laser system as recited in claim 11 further including a means for directing a standard carbon dioxide assist gas to the material to be processed. ### Claim 17 A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and means for directing the beam to the material to be processed. ### Claim 18 (depends on 17) A laser system as recited in claim 17 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 19 A laser system for materials processing comprising: a sealed gas discharge laser for generating a pulsed output beam and with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 times as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and means for directing the beam to the material to be processed. ### Claim 20 (depends on 19) A laser system as recited in claim 19 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 21 A method for processing materials comprising: generating a pulsed laser beam from a gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, whereby said laser can be operated at repetition rates in a range between 10 and 20 Khz while maintaining a depth of modulation of at least ninety percent between the output pulses; and directing the beam to the material to be processed. ### Claim 22 (depends on 21) A method as recited in claim 21 wherein the laser is excited by an RF signal. ### Claim 23 (depends on 21) A method as recited in claim 21 wherein the laser is sealed. ### Claim 24 (depends on 23) A method as recited in claim 23 wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the gas mixture includes nitrogen and wherein the pressure of the isotopic carbon dioxide is greater than the pressure of the nitrogen. ### Claim 25 (depends on 23) A method as recited in claim 23 wherein the gas in the sealed discharge laser is defined by a gas mixture wherein the gas mixture consists primarily of isotopic carbon dioxide, helium and xenon. ### Claim 26 (depends on 25) A method as recited in claim 25 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 27 (depends on 21) A method as recited in claim 21 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 28 (depends on 21) A method as recited in claim 21 further including the step of directing a flow of an assist gas to the material to be processed and wherein the assist gas is standard carbon dioxide. ### Claim 29 A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected to provide a depth of modulation of said laser output of at least eighty percent at pulse repetition rates up to 20 Khz; and directing the beam to the material to be processed. ### Claim 30 (depends on 29) A method as recited in claim 29 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 31 A method for processing materials comprising: generating a pulsed laser beam from a sealed gas discharge laser, with the lasing gas being predominantly an isotope of carbon dioxide, wherein the gas in the sealed discharge laser is defined by a gas mixture and wherein the pressure of the gas mixture and the composition of the constituents are selected so that the rise and fall times of each pulse are at least 1.6 time as fast as the rise and fall times of a pulse that would be created using standard carbon dioxide gas as the lasing species; and directing the beam to the material to be processed. ### Claim 32 A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety percent at pulse repetition rates in the range of 10 to 20 Khz. ### Claim 33 (depends on 32) A laser as recited in claim 32 wherein the lasing species is the .sup.13 CO.sub.2 isotope. ### Claim 34 A laser for use in materials processing comprising: a sealed housing for holding a lasing gas mixture; a resonant cavity defining a gas discharge region; a pair of electrodes for exciting said gas mixture in said gas discharge region; and a pulsed RF excitation means for energizing said electrodes and exciting said gas mixture in said gas discharge region to generate a pulsed laser beam and wherein the lasing species in said gas mixture consists primarily of an isotope of carbon dioxide with the remaining constituents and pressure of said gas mixture being selected to provide a depth of modulation of said laser output of at least ninety-five percent at pulse repetition rates up to 10 Khz. ### Claim 35 (depends on 34) A laser as recited in claim 34 wherein the lasing species is the .sup.13 CO.sub.2 isotope.