# US 5,352,505 A · Plasma enhanced chemical vapor deposition of oxide film stack

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- Number: US 5,352,505 A
- Document ID: US5352505A
- Status: Granted
- Kind: A
- Application number: 08/073,230
- Filed: 1993-06-04
- Granted: 1994-10-04
- Earliest claimed: 1991-07-01
- Assignees: Ford Motor Company
- Inventors: Annette J. Krisko; James W. Proscia
- Web page: https://patentgrep.com/patent/US5352505A

## CPC

- C03C 17/3417: {all coatings being oxide coatings}
- C23C 16/405: {of refractory metals or yttrium}
- G02F 1/1524: Transition metal compounds
- Y10T 428/24942: including components having same physical characteristic in differing degree
- Y10T 428/24975: No layer or component greater than 5 mils thick
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A plasma enhanced chemical vapor deposition method is provided for depositing an oxide film onto a substrate surface. Deposition is achieved even onto a surface of a glass or other relatively non-receptive substrate. A sub-film is deposited under plasma enhanced chemical vapor deposition conditions more strongly favoring deposition, followed by deposition of the desired oxide film under second plasma enhanced chemical vapor deposition conditions less strongly favoring deposition. High quality oxide films can be achieved by deposition at second plasma enhanced chemical vapor deposition conditions only marginally favoring deposition over etching.

## Claims

### Claim 1

An article comprising a substrate and an infrared reflective film stack on a surface of the substrate, the film stack comprising a 10 to 100 nm thick sub-film of amorphous tungsten oxide and a 50 to 1,000 nm thick film of substantially stoichiometric, crystalline tungsten oxide on the sub-film.

### Claim 2 (depends on 1)

The article of claim 1 further comprising a 500 to 5,000 nm thick protective film of silicon dioxide over the film of crystalline tungsten oxide.