# US 5,348,837 A · Projection exposure apparatus and pattern forming method for use therewith

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- Number: US 5,348,837 A
- Document ID: US5348837A
- Status: Granted
- Kind: A
- Application number: 08/012,479
- Filed: 1993-02-02
- Granted: 1994-09-20
- Earliest claimed: 1991-09-24
- Assignees: Hitachi, Ltd.
- Inventors: Hiroshi Fukuda; Ryoko Yamanaka; Tsutomu Tawa; Tsuneo Terasawa; Seiji Yonezawa
- Web page: https://patentgrep.com/patent/US5348837A

## CPC

- G03F 7/70066: {Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds}
- G03F 7/2002: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image}
- G03F 7/701: {Off-axis setting using an aperture}
- G03F 7/70191: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like}
- G03F 7/70241: {Optical aspects of refractive lens systems, i.e. comprising only refractive elements}
- G03F 7/70308: {Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift}
- G03F 7/70333: {Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]}
- G03F 7/70375: {Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation}
- G03F 7/70891: {Temperature}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.

## Claims

### Claim 1

A projection exposure apparatus comprising:
a light source;
shaping means for making the illumination distribution of light beams from said light source annular on the plane of an effective source relative to an optical axis;
illumination optics for irradiating the light from the plane of said effective source onto a mask having a predetermined pattern;
projection lens means for projecting said pattern onto a resist film; and
transmittance reducing means for making the transmittance of a first region on the pupil plane of said projection lens means lower than that of a second region on the pupil plane of said projection lens means, said first region being inside of the outer periphery of an annular region substantially conjugate with said effective source, and said second region being outside of said outer periphery.

### Claim 2 (depends on 1)

A projection exposure apparatus according to claim 1, wherein the transmittance of said annular region is lower than that of other regions on said pupil plane.

### Claim 3 (depends on 1)

A projection exposure apparatus according to claim 1, wherein said transmittance reducing means includes an optical spatial filter having a transmission distribution such that the transmittance inside of said annular region substantially conjugate with said effective source is smaller than the transmittance outside thereof.

### Claim 4 (depends on 3)

A projection exposure apparatus according to claim 3, wherein the transmittance inside of said annular region is 35 to 65 percent of the transmittance outside thereof.

### Claim 5 (depends on 3)

A projection exposure apparatus according to claim 3, wherein said transmittance reducing means is displaced in the optical axis direction from any one of the pupil plane of said projection lens means and a surface conjugate with said pupil plane.

### Claim 6 (depends on 5)

A projection exposure apparatus according to claim 5, wherein said transmittance reducing means reduces the peak light intensity of an effective source image on a surface perpendicular to said optical axis to at least 50 percent of the peak light intensity of another effective source image obtained on any one of said pupil plane and said surface conjugate with said pupil plane.

### Claim 7 (depends on 5)

A projection exposure apparatus according to claim 5, wherein said optical spatial filter has transmitting and non-transmitting parts and a feature size that is smaller than 10 percent of the radius of said pupil plane, said optical spatial filter being disposed on any one of said pupil plane and said surface conjugate with said pupil plane, and wherein the area ratio of said transmitting parts in a localized region of said optical spatial filter is substantially the same in absolute value as a predetermined amplitude transmission distribution.

### Claim 8 (depends on 1)

A projection exposure apparatus according to claim 1, wherein said annular region of said pupil plane is such as to fulfill the relations
0.6.ltoreq..sigma./r.ltoreq.0.7
0.1.ltoreq.W/r.ltoreq.0.3
where, .sigma. is the radius of the center of said annular region, W is the width of the said annular region, and .GAMMA. is the radius of the pupil.

### Claim 9 (depends on 1)

A projection exposure apparatus according to claim 1, further comprising means for attenuating the illumination distribution of said annular region.

### Claim 10 (depends on 1)

A projection exposure apparatus according to claim 1, wherein the illumination distribution of said effective source has intensity peaks which are substantially symmetrical around said optical axis, and wherein the transmittance of the region substantially conjugate with the illuminating region of said effective source is lower than the transmittance of the remaining regions on the pupil plane of said projection lens means.

### Claim 11 (depends on 1)

A projection exposure apparatus according to claim 1, wherein said transmittance reducing means includes an optical filter provided with means for cooling thereof.

### Claim 12 (depends on 1)

A projection exposure apparatus according to claim 1, wherein said transmittance reducing means includes an optical filter disposed in the pupil plane of said projection lens means so as to substantially cover the entire first region.

### Claim 13 (depends on 1)

A projection exposure apparatus according to claim 1, further comprising means defining an iris for the projection exposure apparatus, wherein the shaping means shapes the diameter of the annular illumination distribution to be smaller than the diameter of the iris.

### Claim 14

A pattern forming method comprising the steps of:
illuminating onto a mask the light from an effective source having a substantially annular illumination distribution around an optical axis;
forming the light having passed said mask into an image by use of a projection lens;
making the transmittance of a first region on the pupil plane of said projection lens lower than that of a second region on the pupil plane of said projection lens, said first region being inside of the outer periphery of an annular region substantially conjugate with said effective source having the annular illumination distribution, and said second region being outside of said outer periphery; and
exposing a photo-resist film to said image to form a pattern thereon.

### Claim 15 (depends on 14)

A pattern forming method according to claim 14, wherein said making step includes the step of providing an optical filter in the pupil plane of the projection lens so as to substantially cover the entire first region.