# US 5,348,805 A · Formation of a layer of aluminum and tin or titanium oxides on a glass substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,348,805 A - Document ID: US5348805A - Status: Granted - Kind: A - Application number: 08/014,100 - Filed: 1993-02-05 - Granted: 1994-09-20 - Earliest claimed: 1990-07-05 - Assignees: Saint-Gobain Vitrage International - Inventors: Georges Zagdoun; Bruno Cordier - Web page: https://patentgrep.com/patent/US5348805A ## CPC - C03C 17/25: by deposition from the liquid phase - C03C 17/3417: {all coatings being oxide coatings} - C03C 2217/23: Mixtures - C03C 2218/112: by spraying - Y10T 428/24917: including metal layer - Y10T 428/24926: including ceramic, glass, porcelain or quartz layer - Y10T 428/24942: including components having same physical characteristic in differing degree - Y10T 428/24975: No layer or component greater than 5 mils thick - Y10T 428/31601: Quartz or glass - Y10T 428/3163: Next to acetal of polymerized unsaturated alcohol [e.g., formal butyral, etc.] - Y10T 428/31649: Ester, halide or nitrile of addition polymer - C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A solution of an organic compound of aluminum and tin or titanium is formed from, respectively, a nonhydrolyzable aluminum chelate and at least one organic compound of tin or a titanium chelate or alcoholate. The solution is then sprayed onto a heated glass substrate, thereby thermally decomposing and oxidizing the solution on the heated glass substrate to form, respectively, a layer of aluminum and tin or titanium oxides on the glass substrate. A semiconductive layer can be deposited upon the aluminum/tin or aluminum/titanium layer to form a coated glass structure which is useful for buildings or automobiles. ## Claims ### Claim 1 A coated glass structure for use as a glazing, comprising: a glass substrate; and a layer of aluminum oxide and titanium oxide upon at least a portion of said glass substrate and a semiconductive layer upon at least a portion of said layer of aluminum oxide and titanium oxide; wherein said layer of aluminum oxide and titanium oxide has an index of refraction of between about 1.73 and 1.80, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm and 150 nm with a thickness variation of less than or equal to about 5%, and wherein said layer of aluminum oxide and titanium oxide is formed on said glass substrate by heating said glass substrate to a temperature less than its softening temperature, forming a solution of a non-hydrolyzable aluminum chelate and at least two heat decomposable titanium compounds to form a solution having a weight ratio of Al:Ti of not greater than about 2:1, and spraying said solution onto said heated glass substrate to thermally decompose and oxidize said solution on said heated glass substrate to form a layer of aluminum oxide and titanium oxide on said glass substrate. ### Claim 2 (depends on 1) The structure of claim 1 which further comprises: a plastic sheet of PVB, PVC, or PU polymer; and a glass plate having an upper edge and a lower edge, wherein power lead-ins are placed along said upper edge and said lower edge; and wherein said plastic sheet is inserted in contact with and in between said semiconductive layer and said glass plate to form a heated, laminated glazing. ### Claim 3 (depends on 1) The structure of claim 1 which further comprises a semiconductive layer on said layer of aluminum oxide and titanium oxide. ### Claim 4 (depends on 1) The structure of claim 1, wherein said semiconductive layer is a layer of tin oxide doped with fluorine, a layer of indium oxide doped with tin or a layer of zinc oxide doped with indium or aluminum. ### Claim 5 (depends on 4) The structure of claim 4, wherein said layer of aluminum oxide and titanium oxide has a thickness between about 80 nm and 100 nm and said semiconductive layer has a thickness between about 100 nm and 800 nm; wherein said layer of aluminum oxide and titanium oxide and said semiconductive layer form a coating structure which is neutral in reflection with a purity in reflection less than or equal to about 10%. ### Claim 6 (depends on 4) The structure of claim 4, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3%, an index of refraction of about 1.75.+-.0.01 and a thickness of about 90 nm with a thickness variation less than or equal to about 5%; said semiconductive layer has a thickness of 360 nm; and said layer of aluminum oxide and titanium oxide and said semiconductive layer form a coating structure which is neutral in reflection with a purity in reflection of approximately 5%. ### Claim 7 (depends on 3) The structure of claim 3, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3% and a thickness between about 80 nm and 100 nm with a thickness variation less than or equal to about 5%; said semiconductive layer is formed of tin oxide doped with fluorine and has a emissivity less than or equal to about 0.27 and a thickness greater than or equal to about 300 nm; and said aluminum oxide and tin oxide layer, said semiconductive layer and said glass substrate form a low-emissivity glazing, wherein said low-emissivity glazing is neutral in reflection with a purity in reflection less than or equal to about 10%. ### Claim 8 (depends on 5) The structure of claim 5, wherein said layer of aluminum oxide and titanium oxide has an absorption percentage of less than or equal to about 3% and a thickness variation less than or equal to about 5%; said semiconductive layer has a resistivity of approximately 6.times.10.sup.-4 .OMEGA. cm; and said aluminum oxide and titanium oxide layer, said semiconductive layer and said glass substrate form a heated glazing which is neutral in reflection with a purity in reflection less than or equal to about 10%. ### Claim 9 (depends on 6) The structure of claim 6, which further comprises: a plastic sheet of PVB, PVC, or PV polymer; and a glass plate having an upper edge and a lower edge, wherein power lead-ins are placed along said upper edge and said lower edge; wherein said plastic sheet is inserted in contact with and in between said semiconductive layer and said glass plate to form a heated, laminated glazing. ### Claim 10 A coated glass structure for use as a glazing, comprising: a glass substrate; and a layer of aluminum oxide and titanium oxide upon at least a portion of said glass substrate; wherein said layer of aluminum oxide and titanium oxide has an index of refraction between about 1.73 to 1.80, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm to 150 nm with a thickness variation less than or equal to about 5%. ### Claim 11 A coated glass structure for use as a glazing, comprising: a glass substrate and a stack of layers on the glass substrate, said stack comprising, a layer of aluminum oxide and tin oxide upon at least a portion of said glass substrate, said layer having an Al to Sn ratio between 1.15 to 1.40; a titanium oxide layer formed on said layer of aluminum oxide and tin oxide, and a semiconductive layer upon at least a portion of said layer of aluminum oxide and tin oxide to form a glazing which is neutral in reflection with a purity in reflection less than or equal to about 10%, wherein said layer of aluminum oxide and tin oxide has an index of refraction between about 1.65 to 1.76, an absorption percentage over the visible spectrum of less than or equal to about 3%, and a thickness between about 40 nm to 150 nm with a thickness variation less than or equal to about 5%, and wherein said layer of aluminum oxide and tin oxide is formed by heating said glass substrate to a temperature less than its softening temperature, forming a solution of a non-hydrolyzable aluminum chelate and tin compounds to form a solution having a weight ratio of Al:Sn of about 0.10:1 to 0.70:1, spraying said solution onto said heated glass substrate to thermally decompose and oxidize said solution on said heated glass substrate to form said layer of aluminum oxide and tin oxide on said glass substrate. ### Claim 12 (depends on 11) The coated glass structure of claim 11 further comprising a silicon oxide layer on said titanium oxide layer. ### Claim 13 (depends on 12) The coated glass structure of claim 12 wherein said titanium oxide layer has an optical thickness of about .lambda./2. ### Claim 14 (depends on 13) The coated glass structure of claim 13 wherein said silicon oxide layer has an optical thickness of about .lambda./4.