Method and composition to enhance acid dye stain resistance of polyamides by improving resistance to detergent washings and products thereof
AssigneeAllied-Signal Inc.
InventorsLidia T. Calcaterra, Mathias P. Koljack
Life of this patent
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Abstract
A method of imparting acid dye stain resistance to polyamide substrates having improved durability of the stain resistance to detergent washings comprising treating the polyamide substrate with an effective amount of a mixture of phenyl vinyl ether/maleic diacid copolymer and 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer, wherein the phenyl vinyl ether/maleic diacid copolymer is the stain resist agent, and the 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer is added to improve the durability of the stain resist agent.
Claims9
A composition useful in imparting acid dye stain resistance with improved durability to detergent washings, to polyamide substrates, said composition comprising a) the mixture of phenyl vinyl ether/maleic diacid copolymer and 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether/maleic diacid copolymer, b) a copolymer obtained by the reaction of phenyl vinyl ether, 2-(4-hydroxymethyl-phenoxy)-ethyl vinyl ether and maleic anhydride, and c) mixtures thereof.
Dependencies are inferred from the claim text.