Synthesis of semiconductor grade tungsten hexafluoride
AssigneeBandgap Technology Corporation
InventorsBruce J. Sabacky, Robert E. Doane
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Abstract
Semiconductor grade tungsten hexafluoride (WF.sub.6) is produced by reacting tungsten metal with a recirculating flow of gaseous WF.sub.6 containing a small concentration of fluorine in a heated reactor. The high purity WF.sub.6 produced is useful for deposition of tungsten metallization in fabricating VLSI integrated circuitry.
Claims8
The process for producing tungsten hexafluoride having a purity sufficient for use in semiconductor application which comprises placing tungsten metal in a closed reactor and reacting said tungsten metal with a gas stream consisting essentially of a major proportion of gaseous tungsten hexafluoride and a minor proportion of fluorine.
The process in accordance with claim 6, wherein said reactor is made of nickel.
Dependencies are inferred from the claim text.