# US 5,344,746 A · Integrated light deflector and method of fabrication therefor

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- Number: US 5,344,746 A
- Document ID: US5344746A
- Status: Granted
- Kind: A
- Application number: 08/062,128
- Filed: 1993-05-14
- Granted: 1994-09-06
- Earliest claimed: 1992-01-14
- Assignees: International Business Machines Corporation
- Inventors: Peter Vettiger; Otto Voegeli
- Web page: https://patentgrep.com/patent/US5344746A

## CPC

- H01S 5/185: having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL] (comprising a photonic bandgap structure H01S5/11)
- G03F 7/0005: {Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor}
- G03F 7/2002: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image}
- Y10S 430/168: X-ray exposure process
- H01S: DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.

## Claims

### Claim 1

A method for fabricating a light deflector in a large scale laser integration device, the method comprising the steps of:
applying a coating of photo resist material on a substrate;
creating a masked portion and adjacently unmasked portions of said photo resist coating by placing a mask at a selected position on said coating, said mask having a masking edge defining a selected position of a light deflector to be created;
exposing the unmasked portions of said photo resist coating to a collimated light beam at a selected angle of incidence corresponding to a selected canting angle of the light deflector to be created;
removing said mask and developing the photo resist material to produce a cavity corresponding to the masked portion of said photo resist coating and extending from the surface of said photo resist coating to said substrate; and
casting the light deflector to be created by filling said cavity with a deflector material.

### Claim 2 (depends on 1)

The method of claim 1 further including the step of dissolving the adjacent unmasked portions of said photo resist coating to yield a deflector body extending from said substrate.

### Claim 3 (depends on 1)

The method of claim 1 wherein said collimated light beam is an X-ray beam.

### Claim 4 (depends on 1)

The method of claim 1 wherein the selected angle of incidence of said collimated light beam is substantially forty-five degrees.

### Claim 5 (depends on 1)

The method of claim 1 wherein said deflector is created by electroplating.

### Claim 6 (depends on 1)

The method of claim 1 wherein said deflector material is gold.

### Claim 7 (depends on 1)

The method of claim 1 wherein said photo resist layer is of a selected thickness corresponding to the height of the deflector to be created.

### Claim 8 (depends on 1)

The method of claim 1 wherein prior to said step of applying a coating of photo resist material said substrate is etched to produce a deflector trench defined by at least one side wall and wherein said deflector is formed adjacent to said side wall, said side wall providing a laser beam exit site and said deflector being positioned to deflect said laser beam perpendicularly to said substrate.