# US 5,344,744 A · Photosensitive resin composition

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- Number: US 5,344,744 A
- Document ID: US5344744A
- Status: Granted
- Kind: A
- Application number: 07/848,360
- Filed: 1992-03-09
- Granted: 1994-09-06
- Earliest claimed: 1991-04-24
- Assignees: Nippon Paint Co., Ltd.
- Inventors: Koichi Ueda; Kazunori Kanda; Hidefumi Kusuda
- Web page: https://patentgrep.com/patent/US5344744A

## CPC

- G03F 7/031: Organic compounds not covered by group G03F7/029
- Y10S 430/108: Polyolefin or halogen containing
- Y10S 430/111: Polymer of unsaturated acid or ester
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

The present invention imparts elasticity, reproducibility of dots, film toughness and wear resistance to printing plates obtained therefrom, in addition to good water developability and mechanical properties, by providing a photosensitive resin composition comprising: (A) 10 to 90% by weight of specific crosslinked polymer particles having a particle size of 0.01 to 5 micron, (B) 10 to 70% by weight of a specific hydrophobic elastomer, (C) 1 to 25% by weight of a hydophilic polymer having a molecular weight of 1,000 to 1,000,000, (D) 1 to 30% by weight of a basic nitrogen-containing compound, (E) 1 to 60% by weight of a photopolymerizable ethylenically unsaturated monomer, and (F) 0.01 to 10% by weight of a photopolymerization initiator; % by weight being based on a total amount of the resin composition. The present invention also provides a flexoprinting plate obtained from the above resin composition and a process for producing the flexoprinting plate.

## Claims

### Claim 1

A photosensitive resin composition comprising:
(A) 25 to 80% by weight of crosslinked polymer particles having a particle size of 0.01 to 5 micron, prepared from an aliphatic conjugated diene monomer, a monofunctional monomer and a polyfunctional monomer,
(B) 10 to 70% by weight of a hydrophobic elastomer having a molecular weight of 5,000 to 1,000,000 and at least one glass transition temperature of 5.degree. C. or less, prepared from at least 30 mol % of a conjugated diene monomer and the balance of other monomers,
(C) 1 to 25% by weight of a hydrophilic polymer having a molecular weight of 1,000 to 1,000,000, prepared by introducing hydrophilic groups into a backbone polymer selected from the group consisting of (1) a polymer obtained from a conjugated diene, (2) a copolymer of a conjugated diene and a monoolefinic unsaturated compound, and (3) a vinyl polymer other than the polymer (1) and the copolymer (2),
(D) 1 to 30% by weight of a basic nitrogen-containing compound,
(E) 1 to 60% by weight of a photopolymerizable ethylenically unsaturated monomer, and
(F) 0.01 to 10% by weight of a photopolymerization initiator; % by weight being based on a total amount of the resin composition.

### Claim 2 (depends on 1)

The photosensitive resin composition according to claim 1 wherein said crosslinked polymer particles (A) are prepared from
(1) 20 to 95% by weight of an aliphatic conjugated diene monomer,
(2) 0.1 to 30% by weight of alpha, beta-ethylenically unsaturated carboxyl group-containing monomer,
(3) 0.1 to 10% by weight of a monomer having at least 2 addition-polymerizable groups in one molecule, and
(4) 0.5 to 70% by weight of copolymerizable monomer other than the monomers (1), (2) and (3).

### Claim 3 (depends on 1)

The photosensitive resin composition according to claim 1 wherein said basic nitrogen-containing compound (D) is represented by the following formula (I) or (II): ##STR3## wherein n is an integer of 1 to 3, X represents --O--CO--CR.dbd.CH.sub.2, --NH--CO--CR.dbd.CH.sub.2 or --O--CO--NH--CO--CR.dbd.CH.sub.2 in which R independently represents a hydrogen atom or a methyl group ##STR4## wherein n is an integer of 1 to 6 when R' is a methyl group and an integer of 2 to 6 when R' is an ethyl group, Y represents a hydrogen atom, --CO--CR.dbd.CH.sub.2 or --CO--NH--CO--CR.dbd.CH.sub.2 in which R independently represents a hydrogen atom or a methyl group.

### Claim 4

A photosensitive resin plate for flexoprinting comprising a substrate and a layer of a photosensitive resin composition formed thereon, wherein said photosensitive resin composition comprises
(A) 25 to 80% by weight of crosslinked polymer particles having a particle size of 0.01 to 5 micron, prepared from an aliphatic conjugated diene monomer, a monofunctional monomer and a polyfunctional monomer,
(B) 10 to 70% by weight of a hydrophobic elastomer having a molecular weight of 5,000 to 1,000,000 and at least one glass transition temperature of 5.degree. C. or less, prepared from at least 30 mol % of a conjugated diene monomer and the balance of other monomers,
(C) 1 to 25% by weight of a hydrophilic polymer having a molecular weight of 1,000 to 1,000,000, prepared by introducing hydrophilic groups into a backbone polymer selected from the group consisting of (1) a polymer obtained from a conjugated diene, (2) a copolymer of a conjugated diene and a monoolefinic unsaturated compound, and (3) a vinyl polymer other than the polymer (1) and the copolymer (2),
(D) 1 to 30% by weight of a basic nitrogen-containing compound,
(E) 1 to 60% by weight of a photopolymerizable ethylenically unsaturated monomer, and
(F) 0.01 to 10% by weight of a photopolymerization initiator; % by weight being based on a total amount of the resin composition.

### Claim 5 (depends on 4)

The photosensitive resin plate for flexoprinting according to claim 4 wherein said crosslinked polymer particles (A) are prepared from
(1) 20 to 95% by weight of an aliphatic conjugated diene monomer,
(2) 0.1 to 30% by weight of alpha, beta-ethylenically unsaturated carboxyl group-containing monomer,
(3) 0.1 to 10% by weight of a monomer having at least 2 addition-polymerizable groups in one molecule, and
(4) 0.5 to 70% by weight of copolymerizable monomer other than the monomers (1), (2) and (3).

### Claim 6 (depends on 4)

The photosensitive resin plate for flexoprinting according to claim 4 wherein said basic nitrogen-containing compound (D) is represented by the following formula (I) or (II): ##STR5## wherein n is an integer of 1 to 3, X represents --O--CO--CR.dbd.CH.sub.2, --NH--CO--CR.dbd.CH.sub.2 or --O--CO--NH--CO--CR.dbd.CH.sub.2 in which R independently represents a hydrogen atom or a methyl group ##STR6## wherein n is an integer of 1 to 6 when R' is a methyl group and an integer of 2 to 6 when R' is an ethyl group, Y represents a hydrogen atom, --CO--CR.dbd.CH.sub.2 or --CO--NH--CO--CR.dbd.CH.sub.2 in which R independently represents a hydrogen atom or a methyl group.

### Claim 7 (depends on 4)

The photosensitive resin plate for flexoprinting according to claim 4 wherein said photosensitive resin composition layer is formed by melt-mixing said components (A) to (F) and then extruding the resultant mixture on said substrate.