# US 5,344,740 A · Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same

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- Number: US 5,344,740 A
- Document ID: US5344740A
- Status: Granted
- Kind: A
- Application number: 07/879,101
- Filed: 1992-05-04
- Granted: 1994-09-06
- Earliest claimed: 1989-07-12
- Assignees: Kansai Paint Co., Ltd.
- Inventors: Naozumi Iwasawa; Junichi Higashi; Shinsuke Onishi
- Web page: https://patentgrep.com/patent/US5344740A

## CPC

- G03F 7/0226: {characterised by the non-macromolecular additives}
- G03F 7/023: Macromolecular quinonediazides; Macromolecular additives, e.g. binders {(G03F7/0226 takes precedence)}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A positive-type photosensitive electrodeposition coating composition comprising (A) a resin component containing in a molecule at least one unit selected from the group consisting of an ortho-benzoquinonediazidesulfone unit represented by the general formula ##STR1## an ortho-naphthoquinonediazidesulfone unit represented by the general formula ##STR2## as a photosensitive group, and an anion-forming group; and (B) at least one of the specified particular nitrogen-containing compounds. The composition is useful for the production of a circuit plate.

## Claims

### Claim 1

A positive-type photosensitive electrodeposition coating composition comprising
(A) a resin component containing in the same molecule at least one photosensitive group and an anion-forming group, the photosensitive group being selected from the group consisting of an ortho-benzoquinonediazidesulfone unit represented by the general formula ##STR24## an ortho-naphthoquinonediazidesulfone unit represented by the general formula ##STR25## the amount of the photosensitive group in the resin component being 5 to 60% by weight, the content of the anion-forming group being 0.2 to 2.5 mols per Kg of the solid content of the resin, and the resin having a number-average molecular weight of 3,000 to 100,000, and
(B) at least one of the nitrogen-containing compounds represented by the following general formulae (1) to (6): ##STR26## hydroxyl group, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom, a chlorine atom or an alkyl group having 1 to 6 carbon atoms, ##STR27## wherein R.sub.4 and R.sub.5 independently represent a hydrogen atom, or an alkyl group having 1 to 6 carbon atoms, ##STR28## wherein R.sub.6, R.sub.7 and R.sub.8 independently represent a hydrogen atom, a hydroxyl group or an alkyl group having 1 to 12 carbon atoms, ##STR29## wherein R.sub.9, R.sub.10 and R.sub.11 independently represent a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 12 carbon atoms or ##STR30## an alkoxy group having 1 to 12 carbon atoms, wherein R.sub.12 represents a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms, ##STR31## wherein R.sub.13 and R.sub.14 independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms and n is an integer of 1 to 3.

### Claim 2 (depends on 1)

The composition of claim 1 wherein the resin component (A) is an acrylic resin.

### Claim 3 (depends on 1)

The composition of claim 1 wherein the anion-forming group is a carboxyl group.

### Claim 4 (depends on 1)

The composition of claim 1 wherein the nitrogen-containing compound (B) is a benzotriazole represented by the general formula (1).

### Claim 5 (depends on 4)

The composition of claim 4 wherein the benzotriazole is selected from the group consisting of ##STR32##

### Claim 6 (depends on 1)

The composition of claim 1 wherein the amount of the nitrogen-containing compound (B) is 0.1 to 20 parts by weight per 100 parts by weight of the solids content of the resin component (A).

### Claim 7 (depends on 1)

A process for producing a circuit plate, which comprises
(i) a step of coating the electrodeposition coating composition of claim 1 on a surface of a circuit substrate having an electrically conductive coating to form a positive-type photosensitive coating,
(ii) a step of exposing the positive-type photosensitive coating to light via a pattern mask,
(iii) a step of forming an etching pattern by removing the photosensitive coating in the exposed portion,
(iv) a step of removing the exposed electrically conductive coating by etching, and
(v) removing the photosensitive coating on the circuit pattern.