Semiconductor substrate including a single or multi-layer film having different densities in the thickness direction
AssigneeCanon Kabushiki Kaisha
InventorsTomoko Maruyama, Takashi Iizuka
Life of this patent
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Abstract
An X-ray mask support has an X-ray permeable film and a support frame supporting the film and the X-ray permeable film mainly includes a single-layer film having different densities in its thickness direction or a multi-layer laminate film of layers having different densities, but being constituted of compounds having the same main component. The X-ray mask support can be used as an X-ray mask structure for X-ray lithography by providing an X-ray absorber on the X-ray permeable film. The X-ray permeable film exhibits a high permeability for X-rays and visible/near infrared rays and does not bend even by X-ray irradiation, thereby achieving X-ray exposure of high precision and high resolution.
Claims93
An X-ray mask support having an X-ray permeable film and a support frame for supporting said X-ray permeable film, said X-ray permeable film mainly comprising a single-layer film having different densities in its thickness direction.
The X-ray mask support according to claim wherein the film surface of said single-layer film adjacent to said support frame is better in alkali resistance than the film surface opposite to said film surface adjacent to said support frame.
An X-ray mask support having an X-ray permeable film and a support frame for supporting said X-ray permeable film, said X-ray permeable mainly comprising a multi-layer laminate film in which adjacent layers have different densities, and all the layers of said multi-layer laminate film are comprised of compounds having the same main constitutional elements.
An X-ray mask structure having an X-ray permeable film, a support frame for supporting said X-ray permeable film and an X-ray absorber supported by said X-ray permeable film, said X-ray permeable film mainly comprising a single-layer film having different densities in its thickness direction.
An X-ray mask structure having an X-ray permeable film, a support frame for supporting said X-ray permeable film and an X-ray absorber supported by said X-ray permeable film, said X-ray permeable film mainly comprising a multi-layer laminate film in which adjacent layers have different densities, and all the layers of said multi-layer laminate film are comprised of compounds having the same main constitutional elements.
An X-ray exposure method comprising:
- providing an X-ray mask structure including an X-ray permeable film, a support frame for supporting said X-ray permeable film and an X-ray absorber supported on said X-ray permeable film, and said X-ray permeable film mainly comprising a single-layer film having different densities in its thickness direction;
- and
- exposing a member to be exposed to X-rays through said X-ray mask structure.
An X-ray exposure method comprising:
- providing an X-ray mask structure, said X-ray mask structure including an X-ray permeable film, a support frame for supporting said X-ray permeable film and an X-ray absorber supported on said X-ray permeable film, said X-ray permeable film mainly comprising a multi-layer laminate film in which adjacent layers have different densities, and all the layers of said multi-layer laminate film being comprised of compounds having the same main constitutional elements;
- and
- exposing a member to be exposed to X-rays through said X-ray mask structure.
Dependencies are inferred from the claim text.