Apparatus for processing photosensitive material
AssigneeEastman Kodak Company
InventorsBruce R. Muller, Douglas O. Hall, David G. Sherburne, Thomas W. Glanville
Life of this patent
Estimating the term…
Loading patent…
AssigneeEastman Kodak Company
InventorsBruce R. Muller, Douglas O. Hall, David G. Sherburne, Thomas W. Glanville
Estimating the term…
An improvement in an apparatus for processing photosensitive materials. The apparatus includes a processing chamber through which the material can be advanced for processing the material. The processing chamber has an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber. The apparatus further includes a tank for holding a processing fluid. At least one nozzle assembly is provided for supplying processing fluid from the tank to the processing chamber. The nozzle assembly comprises an outer nozzle secured to the tank and an inner nozzle secured to the upper tank. The inner and outer nozzles are spaced apart a predetermined distance so as to form a discharge opening therebetween which is in fluid communication with the processing fluid in the tank so as to create a first fluid layer on one side of the photosensitive material passing through the processing chamber. The inner and outer nozzles have a configuration designed to maintain the predetermined distance between the inner and outer nozzles substantially constant along the length of the discharge opening.
In an apparatus for processing photosensitive material, the apparatus having an upper tank for a processing fluid and a lower tank for the processing fluid, an narrow processing chamber between the upper tank and lower thanks through which the photosensitive material can be advanced for processing the photosensitive material, said chamber having an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber, a first nozzle assembly for supplying processing fluid from the upper tank to the processing chamber, said first nozzle assembly comprising and an inner nozzle mounted to the upper tank and at least one outer nozzle secured to said upper tank, said inner and at least one outer nozzle being spaced apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said upper tank so as to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, a second nozzle assembly for supplying processing fluid from the lower tank to the processing chamber, said second nozzle assembly comprising an inner nozzle mounted to the lower tank and at least one outer nozzle secured to the lower tank, said inner and at least one outer nozzle of said second nozzle assembly being spaced apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said lower tank so as to create a second fluid layer on the other side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the improvement comprising;
In an apparatus for processing photosensitive material, the apparatus having a narrow processing chamber through which the material can be advanced for processing the material, said processing chamber having an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber, a tank for holding a processing fluid, a first nozzle assembly for supplying processing fluid from the tank to the processing chamber, said first nozzle assembly comprising an outer nozzle secured to the tank and an inner nozzle mounted to said tank, said inner and outer nozzles being space apart a predetermined distance so as to form a discharge opening therebetween, said discharge opening being in fluid communication with the processing fluid in said tank so as to create a first fluid layer on one side of the photosensitive material passing through the processing chamber;
In an apparatus for processing photosensitive material, the apparatus having an upper tank for a processing fluid and a lower tank for the processing fluid, an narrow processing chamber between the upper tank and lower thanks through which the material can be advanced for processing the material, said chamber having an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber, a first nozzle assembly at the entrance and exit for supplying processing fluid from the upper to the processing chamber, said first nozzle assembly comprising an outer nozzle mounted to the upper tank and an inner nozzle secured to said upper tank, said inner and outer nozzles being space apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said upper tank so as to create a first fluid layer on one side of the photosensitive material, a second nozzle assembly at the entrance and exit for supplying processing fluid from the lower tank to the processing chamber, said second nozzle assembly comprising an outer nozzle mounted to the lower tank and an inner nozzle secured to the lower tank, said inner and outer nozzles of said second nozzle assembly being space apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said lower tank so as to create a second fluid layer on the other side of the photosensitive material;
In an apparatus for processing photosensitive material, the apparatus having a processing chamber through which a photosensitive material can be advanced for processing the photosensitive material, said processing chamber having an entrance and an exit to allow the photosensitive material to travel through the chamber, a tank for supplying a processing fluid, at least one nozzle assembly for applying a layer of a processing fluid to the photosensitive material, said at least one nozzle assembly comprising an outer nozzle secured to the tank and an inner nozzle mounted to said tank, said inner and outer nozzles being space apart a predetermined distance so as to form an elongated discharge opening therebetween for passage of processing fluid so as to create a first fluid layer on one side of the photosensitive material passing through the processing chamber;
In an apparatus for processing photosensitive material, the apparatus having a processing chamber through which a photosensitive material can be advanced for processing the photosensitive material, said processing chamber having an entrance and an exit to allow the photosensitive material to travel through the chamber, a tank for supplying a processing fluid, at least one nozzle assembly for applying a layer of a processing fluid to the photosensitive material, said at least one nozzle assembly comprising an outer nozzle secured to the tank and an inner nozzle mounted to said tank, said inner and outer nozzles being space apart a predetermined distance so as to form an elongated discharge opening therebetween for passage of processing fluid so as to create a first fluid layer on one side of the photosensitive material passing through the processing chamber;
In an apparatus for processing photosensitive material, the apparatus having an upper tank for a processing fluid and a lower tank for the processing fluid, an narrow processing chamber between the upper and lower thanks through which the photosensitive material can be advanced for processing the photosensitive material, said chamber having an entrance at one end and an exit at the other end to allow the photosensitive material to travel through the chamber, a first nozzle assembly for supplying processing fluid from the upper tank to the processing chamber, said first nozzle assembly comprising an inner nozzle mounted to the upper tank and at least one outer nozzle secured to said upper tank, said inner and at least one outer nozzle being spaced apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said upper tank so as to create a first fluid layer on one side of the photosensitive material, a first drain for removing processing fluid from the first fluid layer, a second nozzle assembly for supplying processing fluid from the lower tank to the processing chamber, said second nozzle assembly comprising an inner nozzle mounted to the lower tank and at least one outer nozzle secured to the lower tank, said inner and at least one outer nozzle of said second nozzle assembly being spaced apart a predetermined distance so as to form a discharge opening there between, said discharge opening being in fluid communication with the processing fluid in said lower tank so as to create a second fluid layer on the other side of the photosensitive material, a second drain for removing processing fluid from the second fluid layer, the improvement comprising;
Dependencies are inferred from the claim text.