Correction of charged particle beam exposure deflection by detecting stage position and a position detection mark
AssigneesFujitsu Limited, Fujitsu VLSI Limited
InventorsMitsuhiro Nakano, Junichi Kai
Life of this patent
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AssigneesFujitsu Limited, Fujitsu VLSI Limited
InventorsMitsuhiro Nakano, Junichi Kai
Estimating the term…
A charged particle beam exposure apparatus is provided with a source for irradiating a charged particle beam on an object which has a position detection mark provided thereon and is carried on a movable stage, a deflection part for deflecting the charged particle beam based on deflection signals, a first detection part for detecting the position detection mark of the object, a second detection part for detecting a stage position of the object and for outputting a position detection signal, a moving part for moving the stage which carries the object, and a control unit for controlling inputs and outputs of the source, the deflection part, the first and second detection parts and the moving part. The control unit corrects the deflection signals which are supplied to the deflection part so that the position detection mark is irradiated by the charged particle beam based on the position detection signal which is output from the second detection part and is related to the stage position of the object which is continuously moved by the moving part.
A charged particle beam exposure apparatus comprising:
A method of controlling a charged particle beam exposure apparatus which irradiates a charged particle beam on an object which has a position detection mark provided thereon and is carried on a movable stage, said method comprising the steps of:
Dependencies are inferred from the claim text.