# US 5,334,694 A · Aromatic copolyamides, processes for their preparation and structures formed therefrom

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- Number: US 5,334,694 A
- Document ID: US5334694A
- Status: Granted
- Kind: A
- Application number: 08/008,220
- Filed: 1993-01-25
- Granted: 1994-08-02
- Earliest claimed: 1992-01-27
- Assignees: Hoechst Aktiengesellschaft
- Inventors: Holger Jung; Peter Klein; Karl Heinrich
- Web page: https://patentgrep.com/patent/US5334694A

## CPC

- C08G 69/32: from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
- C08G 69/265: {from at least two different diamines or at least two different dicarboxylic acids}
- C08G: MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS

## Abstract

Aromatic copolyamides are described which are soluble in organic polyamide solvents and which comprise the recurring structural units of the formulae Ia, Ib, Ic and Id [--OC--R.sup.1 --CO--NH--R.sup.2 --NH--] (Ia), [--OC--R.sup.1 --CO--NH--R.sup.3 --NH--] (Ib), [--OC--R.sup.1 --CO--NH--R.sup.4 --NH--] (Ic), [--OC--R.sup.1 --CO--NH--R.sup.5 --NH--] (Id) in which R.sup.1 and R.sup.2 are mainly unsubstituted divalent aromatic radicals, the valency bonds of which are in the para-position or in a comparable coaxial or parallel position with respect to one another, R.sup.3 is a radical of the formula II ##STR1## R.sup.4 is a radical of the formula III --Ar.sup.1 --O--Ar.sup.1 --O--Ar.sup.1 -- (III), and R.sup.5 is a radical of the formula IV and/or V ##STR2## in which Ar.sup.1 has one of the meanings defined for R.sup.2, Y is hydrogen, a halogen atom, a lower alkyl group or a lower alkoxy group and X is a halogen atom, a lower alkyl group or a lower alkoxy group and the molar proportions of recurring structural units Ia, Ib, Ic and Id are fixed within selected limits. Shaped structures composed of the copolyamides according to the invention are distinguished by good mechanical properties.

## Claims

### Claim 1

An aromatic copolyamide which is soluble in organic polyamide solvents and contains the recurring structural units of the formulae Ia, Ib, Ic and Id
[--OC--R.sup.1 --CO--NH--R.sup.2 --NH--] (Ia),
[--OC--R.sup.1 --CO--NH--R.sup.3 --NH--] (Ib),
[--OC--R.sup.1 --CO--NH--R.sup.4 --NH--] (Ic),
[--OC--R.sup.1 --CO--NH--R.sup.5 --NH--] (Id),
in which 90 to 100 mol % of all radicals R.sup.1, with respect to the amount of these radicals in the copolymer, are a divalent aromatic radical, the valency bonds of which are in the para-position or in a comparable coaxial or parallel position with respect to one another, and which is unsubstituted or substituted by one or two inert radicals, and 0 to 10 mol % of all radicals R.sup.1, with respect to the amount of these radicals in the copolymer, are a divalent aromatic radical, the valency bonds of which are in the meta-position or in a comparable angled position with respect to one another, and which is unsubstituted or substituted by one or two inert radicals,
R.sup.2 is a divalent aromatic radical, the valency bonds of which are in the para-position or in a comparable coaxial or parallel position with respect to one another, and which is unsubstituted or substituted by one or two inert radicals, and
R.sup.3 is a radical of the formula II ##STR6## R.sup.4 is a radical of the formula III
--Ar.sup.1 --O--Ar.sup.1 --O--Ar.sup.1 -- (III), and
R.sup.5 is a radical of the formula IV or V or a combination thereof ##STR7## in which Ar.sup.1 has one of the meanings defined for R.sup.2, Y is hydrogen, a halogen atom, a lower alkyl group or a lower alkoxy group, X is a halogen atom, a lower alkyl group or a lower alkoxy group, and the proportion of recurring structural units Ia, Ib, Ic and Id, with respect to the sum of these structural units in the copolymer, is within the following limits:
recurring structural unit of the formula Ia: 30 to 70 mol %;
recurring structural unit of the formula Ib: 15 to 40 mol %;
recurring structural unit of the formula Ic: 5 to 30 mol %; and
recurring structural unit of the formula Id: 5 to 30 mol %.

### Claim 2 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein 90 to 100 mol % of all radicals R.sup.1, are 1,4-phenylene and 0 to 10 mol % of all radicals R.sup.1 are 1,3-phenylene.

### Claim 3 (depends on 2)

The aromatic copolyamide as claimed in claim 2, wherein 100 mol % of the radicals R.sup.1 are 1,4-phenylene.

### Claim 4 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein R.sup.2 is 1,4-phenylene.

### Claim 5 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein Ar.sup.1 is 1,4-phenylene.

### Claim 6 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein Y is hydrogen, chlorine, bromine, methyl or methoxy and X is chlorine, bromine, methyl or methoxy.

### Claim 7 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein R.sup.5 is a radical of the formula IV.

### Claim 8 (depends on 1)

The aromatic copolyamide as claimed in claim 1, wherein the proportion of recurring structural units Ia, Ib, Ic and Id, with respect to the sum of these structural units in the copolymer, is within the following limits:
recurring structural unit of the formula Ia: 40 to 60 mol %;
recurring structural unit of the formula Ib: 20 to 30 mol %;
recurring structural unit of the formula Ic: 10 to 20 mol %; and
recurring structural unit of the formula Id: 10 to 20 mol %.

### Claim 9 (depends on 1)

A shaped structure comprising an aromatic copolyamide as claimed in claim 1.

### Claim 10 (depends on 9)

The shaped structure as claimed in claim 9, which is a fiber, film or coating.