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US 5,334,454 AGranted
Articles by plasma-activated chemical vapor deposition of fluorinated cyclic siloxanes
AssigneeDow Corning Corporation
InventorsGerardo Caporiccio, Riccardo D'Agostino, Pietro Favia
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Abstract
The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'SiO].sub.x, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.
Claims8
A substrate having a coating deposited by a method comprising:
- introducing a sufficient quantity of vapor into a chamber cyclic siloxane with the structure .sub.x in which R is a containing the substrate, wherein the vapor comprises a fluorinated hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4;
- and
- exposing the vapor in the chamber to a radio frequency plasma discharge to cause reaction of the vapor and, thereby, deposition of the coating on the substrate.
Dependencies are inferred from the claim text.