Method of fabricating of diamond moth-eye surface
AssigneeRockwell International Corporation
InventorsAlan B. Harker, Jeffrey F. DeNatale, Patrick J. Hood, John F. Flintoff
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AssigneeRockwell International Corporation
InventorsAlan B. Harker, Jeffrey F. DeNatale, Patrick J. Hood, John F. Flintoff
Estimating the term…
A high temperature resist process is combined with microlithographic patterning for the production of materials, such as diamond films, that require a high temperature deposition environment. For diamond films, a high temperature silicon nitride resist can be used for microlithographic patterning of a silicon substrate to provide a uniform distribution of diamond nucleation sites and to improve diamond film adhesion to the substrate. A fine-grained nucleation geometry, established at the nucleation sites, is maintained as the diamond film is deposited over the entire substrate after the silicon nitride resist is removed. The process can be extended to form surface relief features, such as "moth eye" surfaces, and microstructures of fine-grained polycrystalline diamond, such as rotatable microgears and surface relief patterns, that have the desirable characteristics of hardness, wear resistance, thermal conductivity, chemical inertness, anti-reflectance, and a low coefficient of friction.
A method of forming a diamond moth eye surface, comprising the steps of:
A method of forming a diamond moth eye surface on an optical material, comprising the steps of:
A method of forming a thick film polycrystalline diamond moth eye surface on an optical material, comprising the steps of:
Dependencies are inferred from the claim text.