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US 5,332,879 AGranted
Method for removing trace metal contaminants from organic dielectrics
AssigneeThe Aerospace Corporation
InventorsGouri Radhakrishnan, Heinrich G. Muller
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Abstract
A technique is described for the removal of trace metal contaminants from organic dielectrics such as polyimide. Pulsed ultraviolet radiation is used to remove the contaminants from the dielectric, regardless of their chemical nature, by the process of ablation. The process allows prepatterned bulk metal features to be simultaneously exposed to the pulsed radiation and yet remain unaffected.
Claims15
A method for selectively removing trace metal contaminants from organic dielectrics, comprising the steps of:
- a. adjusting the fluence of a laser beam to a value that selectively ablates trace metal contaminants on an organic dielectric while leaving intact simultaneously exposed features of bulk metal;
- b. exposing an area of the contaminated organic dielectric to the laser beam, thereby causing the removal of the trace metal contaminants.
Dependencies are inferred from the claim text.