Radiation-sensitive composition
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsMakoto Murata, Mikio Yamachika, Yoshiji Yumoto, Takao Miura
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AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsMakoto Murata, Mikio Yamachika, Yoshiji Yumoto, Takao Miura
Estimating the term…
A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5 which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, developability, adhesiveness, heat resistance and yield of residual film thickness.
A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1):
A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1):
A radiation-sensitive composition comprising (A) a polymer consisting only of a recurring unit represented by formula (1):
Dependencies are inferred from the claim text.