US 5,331,018 AGranted

Bimodal cured intermixed polymeric networks which are stable at high temperature

AssigneeThree Bond Co., Ltd.

InventorsVincent D. McGinniss, James L. White, Hiroyuki Mikuni

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Abstract

The present invention is directed to a non-emissive, bimodal cured polymeric network which has an onset degradation temperature that is about 100.degree. C. above the onset degradation temperature of a base polymer. The novel cured polymeric network comprises the cured reaction product of the following ingredients: (a) combination of one or more liquid carrier monomers or prepolymers which combination is reactive to form a base polymer by exposure to ultraviolet (UV) radiation in the presence of a UV photosensitizer at a temperature, T.sub.uv ; and (b) between about 10 and 100 wt-% based on ingredient (a) of a combination of one or more monomers or prepolymers which combination is reactive to form a cured high temperature stable polymer by heating at a temperature, T.sub..DELTA.. Ingredient (b) is soluble or dispersible in ingredient (a) at a temperature, T.sub.s, wherein T.sub.s is equal to or lower than T.sub.uv, and T.sub.uv is at least about 50.degree. C. lower than T.sub..DELTA..

Claims15

Dependent claims

A non-emissive, bimodal-cured, polymeric network which has an onset degradation temperature that is about 100.degree. C. above the onset degradation temperature of a base polymer, and which is the cured reaction product of a mixture of the following ingredients:

(a) a combination of one or more liquid carrier monomers or prepolymers which combination is firstly reacted to form said base polymer by exposure of said mixture to ultraviolet (UV) radiation in the presence of a UV photosensitizer at a temperature, T.sub.uv ;
and
(b) between about 10 and 100 wt-% based on ingredient (a) of a combination of one or more monomers or prepolymers which combination is secondly reacted by heating of said mixture at a temperature, T.sub..DELTA., to form a cured high temperature stable polymer having an onset degradation temperature at least about 100.degree. C. higher than that of said base polymer, at least one of said monomers or prepolymers forming said cured high temperature stable polymer being modified or blocked to be unreactive at temperatures below about T.sub..DELTA. and selected from the group consisting of blocked amine monomers, blocked anhydride monomers, blocked dianhydride monomers, blocked alcohol monomers, and amine-functional silicone resins modified with a maleic anhydride or blocked with a methyl ethyl ketone,
wherein ingredient (b) is soluble or dispersible in ingredient (a) at a temperature, T.sub.s, wherein T.sub.s is equal to or lower than T.sub.uv, and T.sub.uv is at least about 50.degree. C. lower than T.sub..DELTA..

1 more element

A method for curing a bimodual-curable formation to form a polymeric network which has an onset degradation temperature that is about 100.degree. C. above the degradation temperature of a base polymer, which comprises the steps of:

(1) providing a bimodal-curable formulation that is non-emissive upon curing and which comprises the following ingredients:
(a) a combination of one or more liquid carrier monomers or prepolymers and an ultraviolet (UV) radiation photosensitizer which combination is firstly reacted to form a base polymer by exposure to UV radiation in the presence of said UV photosensitizer at a temperature, T.sub.uv ;
and
(b) between about 10 and 100 wt-% based on ingredient (a) of a combination of one or more monomers or prepolymers which combination is secondly reacted to form a cured high temperature stable polymer by heating at a temperature, T.sub..DELTA., wherein ingredient (b) is soluble or dispersible in ingredient (a) at a temperature, T.sub.s and at least one of said monomers or prepolymers forming said cured high temperature stable polymer being modified or blocked to be unreactive at temperatures below about T.sub.4 and selected from the group consisting of blocked amine monomers, blocked anhydride monomers, blocked dianhydride monomers, blocked alcohol monomers, and amine-functional silicone resins modified with a maleic anhydride or blocked with a methyl ethyl ketone,
(2) heating said formulation to temperature, T.sub.uv ;
(3) exposing said formulation to UV radiation for forming said base polymer;
and
(4) heating said exposed formulation of step (3) to temperature T.sub..DELTA. for forming said high temperature stable polymer,
wherein T.sub.s is equal to or lower than T.sub.uv, and T.sub.uv is at least about 50.degree. C. lower than T.sub..DELTA..

6 more elements

Dependencies are inferred from the claim text.