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US 5,330,941 AGranted
Quartz glass substrate for polysilicon thin film transistor liquid crystal display
AssigneeAsahi Glass Company, Limited
InventorsSusumu Yaba, Shinya Kikugawa, Yukinori Ohta
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Abstract
A quartz glass substrate for polysilicon thin film transistor liquid crystal display, in which a halogen content is not more than 10 ppm; an OH content is not more than 100 ppm; a total content of a heavy metal element and an alkali metal element is not more than 1 ppm; and an annealing point is not less than 1,150.degree. C.
Claims5
An optically homogeneous quartz glass substrate for polysilicon thin film transistor liquid crystal displays, having an aluminum content of 5-40 ppm;
- a halogen content of not more than 10 ppm;
- an OH content of not more than 100 ppm;
- a total content of a heavy metal element and an alkali metal element of not more than 1 ppm;
- and an annealing point of not less than 1,180.degree. C.
1 more element
Dependencies are inferred from the claim text.