Production method of photosensitive member by eliminating outermost surface portion of photosensitive layer
AssigneeMinolta Camera Kabushiki Kaisha
InventorsIsao Doi, Kenji Masaki, Shuji Iino, Izumi Osawa
Life of this patent
Estimating the term…
Abstract
This invention relate to a production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising; a first step of forming the organic photosensitive layer on the electrically conductive substrate, a second step of eliminating an outermost surface portion of the organic photosensitive layer, and a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
Claims13
A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising;
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of mechanically wearing the organic photosensitive layer to a degree of 30 .ANG.-2 .mu.m in thickness so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer, and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of dissolving the organic photosensitive layer with a non-chlorinated solvent, in which 30 .ANG.-2 .mu.m in thickness of the surface of the photosensitive layer is removed, so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer;
- and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of leaving the organic photosensitive layer to stand in a vapor phase of a solvent for the time (t) specified by the following formula;
- Kmin.times.H(Tb-Ts).gtoreq.t.ltoreq.Kmax.times.H(Tb-Ts)
- in which
- t(sec) is the time standing in the vapor phase,
- H[J.multidot.K.sup.-1 .multidot.cm.sup.-2 ] is the heat capacity per unit area of the surface of the electronically conductive substrate,
- Tb[K] is the boiling point of the solvent,
- Ts[K] is the temperature of the electrically conductive substrate measured before the photosensitive layer is exposed to the vapor phase,
- Kmin is a proportionality factor, being 1 [J.sup.-1 .multidot.sec], and
- Kmax is a proportionality factor, being 8 [J.sup.-1 .multidot.cm.sup.2 .multidot.sec], so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer;
- and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
A production method of a photosensitive member having an organic photosensitive layer and a surface protective layer in this order on an electrically conductive substrate comprising:
- a first step of forming the organic photosensitive layer by coating a solution which includes a solvent, a binder resin and an organic photosensitive material on the electrically conductive substrate,
- a second step of bombarding the organic photosensitive layer with ions, in which 30 .ANG.-2 .mu.m in thickness of the surface of the photosensitive layer is removed, so as to eliminate an oxidized outermost surface portion of the organic photosensitive layer;
- and
- a third step of forming the surface protective layer under vacuum conditions on the organic photosensitive layer.
Dependencies are inferred from the claim text.