US 5,327,920 AGranted

Automated apparatus and vapor/immersion cleaning method for soiled parts

AssigneeDetrex Corporation

InventorsDonald R. Gerard, William J. Hook, Charles A. Pennington, Robert J. Richardson, II

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Abstract

An automated open topped apparatus and improved method for cleaning soil from metal parts which employs a low vapor tension, low density, LVTC, liquid cleaner in a first tank and a high vapor tension, higher density, immiscible rinse, HVTR, liquid in a second tank and a rinse vapor zone above both tanks in the apparatus which provides steps and means for preventing rinse vapor loss during shut down periods by using microprocessor controlled steps that cause a layer of the liquid cleaner to be positioned atop and cover the liquid rinse in its tank and at the end of the idle period returns the liquid cleaner cover to the first tank and re-starts the cleaning process and thereafter monitors and controls cleaning operation until the succeeding shut down period.

Claims3

Dependent claims

An open top apparatus for removing soil from solid parts comprising:

(1) A housing having a floor and four upstanding walls and an open top,
(2) side by side rinse and cleaner tanks in said housing on said floor and separated by a common wall terminating at its upper end in a dam adapted to accommodate transfer over said dam of rinse and cleaner liquids from one tank to the other tank,
(3) vapor space overlying said rinse and said tanks located between the top of said rinse and cleaner tanks and the level of condenser coils mounted on said walls above said tanks for condensing rinse vapors into distillates and trough means beneath said coils for collecting same and for -transferring said condensed distillates into said rinse tank,
(4) said cleaner tank having heater means adapted to boil LVTC liquids in said tank and microprocessor controlled pump, piping, and valve means for pumping said LVTC liquids from said tank through said piping and said valves and back into said tank to agitate said LVTC liquids in said tank,
(5) said rinse tank having microprocessor controlled pump, piping, and valve means for pumping HVTR liquids from said tank through said piping and said valves and back into said HVTR liquids, and,
(6) microprocessor controlled means for positioning a cover layer of LVTC liquid from said cleaner tank on top of HVTR liquid in said rinse tank of a preselected thickness, said means comprising pump, piping and valve means associated with said rinse tank actuatable by said microprocessor to pump HVTR liquid from the lower portion of said rinse tank into said cleaner tank at a location near the bottom surface thereof in sufficient quantity to cause LVTC liquid to rise and cascade over said dam and form a cover layer of LVTC liquid on the top surface of said HVTR liquid, and sensor means located on said rinse tank for sensing the preset top level of said cover layer of said LVTC liquid connected to microprocessor means for de-energizing said pump to terminate transfer of said HVTR liquid into the lower portion of said cleaner tank.

3 more elements

An open top apparatus for removing soil from solid parts comprising:

(1) a housing having a floor and four upstanding walls and an open top.
(2) side by side rinse and cleaner tanks in said housing on said floor and separated by a common wall terminating at its upper end in a dam adapted to accommodate transfer over said dam of rinse and cleaner liquids from one tank to the other tank,
(3) vapor space overlying said rinse and said cleaner tanks located between the top of said rinse and cleaner tanks and the level of condenser coils mounted on said walls above said tanks for condensing rinse vapors into distillates and trough means beneath said coils for collecting same and for transferring said condensed distillates into said rinse tank,
(4) said cleaner tank having heater means adapted to boil LVTC liquids in said tank and microprocessor controlled pump, piping, and valve means for pumping said LVTC liquids from said tank through said piping and said valves and back into said tank to agitate said LVTC liquids in said tank,
(5) said rinse tank having microprocessor controlled pump, piping, and valve means for pumping HVTR liquids from said tank through said piping and said valves and back into said HVTR liquids, and,
(6) microprocessor controlled means for positioning a cover layer of LVTC liquid from said cleaner tank on top of HVTR liquid in said rinse tank of a preselected thickness, said means comprising pump, piping and valve means associated with said rinse tank actuatable by said microprocessor to pump HVTR liquid from the lower portion of said rinse tank into said cleaner tank at a location near the bottom surface thereof in sufficient quantity to cause LVTC liquid to rise and cascade over said dam and form a cover layer of LVTC liquid on top surface of said HVTR liquid, and sensor means located on said rinse tank for sensing the preset top level of said cover layer of said LVTC liquid connected to microprocessor means for de-energizing said pump to terminate transfer of said HVTR liquid into the lower portion of said cleaner tank,
(7) microprocessor controlled means for removing said cover layer of LVTC liquid atop said HVTR liquid in said rinse tank, said means comprising means energizing said heater means in said cleaner tank to boiling to distill HVTR vapors into said vapor space and means for condensing and collecting said distillate and delivering same into said rinse tank to raise the level of rinse liquid and cause the LVTC liquid in said cover layer to cascade into said cleaner tank, and means for sensing the HVTR liquid level at the top of said dam and initiating agitation of said HVTR liquid to said rinse tank, and
(8) microprocessor controlled means for automatically introducing make-up HVTR liquid into said rinse tank prior to initiating the removal of said LVTC liquid cover layer in accordance with (7) which comprises sensor means located in said rinse tank at the preselected low level of the top surface of said LVTC liquid cover layer connected to said microprocessor for signalling the absence of said LVTC cover layer at said low level and microprocessor activation of pump means for pumping sufficient make-up HVTR liquid into said rinse tank to raise the level of the top surface of said LVTC layer to the preset level of the top surface of said layer formed pursuant to step (6).

5 more elements

Dependencies are inferred from the claim text.