Vapor pressure measurement by gas saturation for mixture
AssigneeEthyl Corporation
InventorsRobert N. Sanders, Robin P. McCarthy
Life of this patent
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Abstract
Disclosed herein is an apparatus and process for determining the vapor pressure of materials in a mixture at relatively low vapor pressures by a gas saturation procedure. The process comprises passing an inert gas over a sampled material at a controlled flow rate to create a vapor of the sampled materials that may be collected and analyzed. Of particular importance, this method and apparatus provides a means of collecting vaporized samples over an extended period of time and, therefore, allows even minor components of mixtures to be considered in the final vapor pressure analysis. The apparatus also includes a means for determining whether sampled material has progressed as vapor beyond the means of collecting the sampled material.
Claims13
An apparatus for determining the vapor pressure of a sampled material comprising:
- a) a means of containing and passing an inert gas through said apparatus at a controlled rate,
- b) at least one means of controlling and maintaining the temperature of said inert gas and sampled material throughout the apparatus,
- c) at least one container housing said sampled material and providing a surface area which allows a means of contacting said inert gas with said sampled material to cause the sampled material to be held as a vapor in the inert gas,
- d) a means of collecting the sampled material which has been held as vapor in the inert gas, and
- e) a means of determining whether additional sampled material has progressed as vapor beyond the means of collecting the sampled material.
Dependencies are inferred from the claim text.