Method for forming a thin film on a semiconductor device using an apparatus having a load lock

A method for manufacturing semiconductor devices, comprising the steps of:

• (a) providing at least one main reaction chamber for receiving at least one semiconductor substrate and an auxiliary chamber in communication with said at least one main reaction chamber;
• (b) isolating said at least one main reaction chamber from said auxiliary chamber by moving an isolation structure between an opened condition, wherein said at least one main chamber and said auxiliary chamber communicate with one another, and a closed condition, wherein said at least one main chamber is isolated from said auxiliary chamber;
• (c) establishing within said at least one main reaction chamber a reactive atmosphere so as to form at least one thin membrane on said substrate;
• (d) establishing an inert atmosphere within said auxiliary chamber when said at least one main reaction chamber and said auxiliary chamber are isolated so that said established inert atmosphere exists within said auxiliary chamber concurrently with said reactive atmosphere established within said reaction chamber according to step (c);
• (e) moving said isolation structure from said closed condition and into said opened condition thereof when said inert and reactive atmospheres exist concurrently in said auxiliary and said at least one main reaction chamber, respectively, and then
• (f) transferring said substrate from said auxiliary chamber and into said at least one main reaction chamber when said isolation structure is in said opened condition so that said substrate transferred thereinto is not exposed to an undesired external atmospheric condition.