Electron beam excited ion irradiation apparatus

A method of electron beam excited ion irradiation comprising the steps of:

• generating a discharge in an atmosphere of an inert gas to change the inert gas into a plasma;
• applying a specific potential difference to a plurality of electrons included in the plasma, the specific potential difference changing the plurality of electrons into an accelerated electron beam;
• generating a plurality of ions by passing the accelerated electron beam through an active gas;
• directing the plurality of ions towards a material;
• and
• changing a direction of the accelerated electron beam prior to irradiation of the material to change an electrical potential of the material and to prevent the accelerated electron beam from injecting the material, the accelerated electron beam radiating vertically towards a surface of the material.

An electron beam excited ion irradiation apparatus comprising:

• a plasma filling chamber having a cathode and a first acceleration electrode, the first acceleration electrode acting as an anode with respect to the cathode when a first specific potential difference is applied between the first acceleration electrode and the cathode, the first specific potential difference changing an inert gas in the plasma filling chamber into a plasma;
• an electron beam acceleration chamber having a second acceleration electrode, the second acceleration electrode acting as an anode with respect to the first acceleration electrode when a second specific potential difference is applied between the second acceleration electrode and the first acceleration electrode, the second specific potential difference drawing electrons from the plasma and forming an accelerated electron beam;
• an ion generation chamber having a material setting member and a material, the material positioned on a side of the material setting member facing the second acceleration electrode, the second acceleration electrode generating a plurality of ions when the accelerated electron beam passes through an active gas in the ion generation chamber, the plurality of ions directed towards the material;
• the ion generation chamber having electron movement changing means for changing a direction of the electron beam and for changing an electric potential of the material to prevent injection of the material by the electron beam, the electron movement changing means positioned between the second acceleration electrode and the material;
• the ion generation chamber having a plurality of magnets, the plurality of magnets surrounding the electron beam, the plurality of magnets forming a magnetic field, the magnetic field holding the electron beam inside the ion generation chamber.

An electron beam excited ion irradiation apparatus comprising:

• a plasma filling chamber having a cathode and a first acceleration electrode, the first acceleration electrode acting as an anode with respect to the cathode when a first specific potential difference is applied between the first acceleration electrode and the cathode, the first specific potential difference changing an inert gas in the plasma filling chamber into a plasma;
• an electron beam acceleration chamber having a second acceleration electrode, the second acceleration electrode acting as an anode with respect to the first acceleration electrode when a second specific potential difference is applied between the second acceleration electrode and the first acceleration electrode, the second specific potential difference drawing electrons from the plasma and forming an accelerated electron beam;
• an ion generation chamber having a material setting member and a material, the material being positioned on a side of the material setting member opposite the second acceleration electrode, the second acceleration electrode generating a plurality of ions when the accelerated electron beam passes through an active gas in the ion generation chamber, the plurality of ions directed towards the material,
• the ion generation chamber having a plurality of magnets, the plurality of magnets surrounding the electron beam, the plurality of magnets forming a magnetic field, the magnetic field holding the electron beam inside the ion generation chamber,
• the ion generation chamber having a moving mechanism moving the plurality of magnets in a direction of a diameter of the ion generation chamber.

An electron beam excited ion irradiation apparatus comprising:

• a plasma filling chamber having a cathode and a first acceleration electrode, the first acceleration electrode acting as an anode with respect to the cathode when a first specific potential difference is applied between the first acceleration electrode and the cathode, the first specific potential difference changing an inert gas in the plasma filling chamber into a plasma;
• an electron beam acceleration chamber having a second acceleration electrode, the second acceleration electrode acting as an anode with respect to the first acceleration electrode when a second specific potential difference is applied between the second acceleration electrode and the first acceleration electrode, the second specific potential difference drawing electrons from the plasma and forming an accelerated electron beam;
• an ion generation chamber having a material setting members and a material, the material being positioned on a side of the material setting member opposite the second acceleration electrode, the second acceleration electrode generating a plurality of ions when the accelerated electron beam passes through an active gas in the ion generation chamber, the plurality of ions directed towards the material,
• the ion generation chamber having a plurality of magnets, the plurality of magnets surrounding the electron beam, the plurality of magnets forming a magnetic field, the magnetic field holding the electron beam inside the ion generation chamber,
• the ion generation chamber having an angle changing mechanism changing an angle of a magnetic pole of each of the plurality of magnets with respect to a direction of a diameter of the ion generation chamber to change the magnetic field formed by the plurality of magnets.

A method of electron beam excited ion irradiation comprising the steps of:

• generating a discharge in an atmosphere of an inert gas to change the inert gas into a plasma;
• applying a specific potential difference to a plurality of electrons included in the plasma, the specific potential difference changing the plurality of electrons into an accelerated electron beam;
• generating a plurality of ions by passing the accelerated electron beam through an active gas;
• directing the plurality of ions toward a material;
• and
• changing an electric potential of the material by inclining a surface of the material with respect to a direction of the electron beam. V