Photosensitive compositions
AssigneeUlano Corporation
InventorJohn Curtis
Life of this patent
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Abstract
A photosensitive polymer composition comprising a compound of the structure ##STR1## wherein ##STR2## is a polyvinyl acetal, n is an integer from 1 to 6, R is hydrogen or alkyl, m is an integer from 1 to 6, X is an anion, ##STR3## is a divalent radical having the structure ##STR4## Y is a monovalent radical having the structure ##STR5## where is a 5 or 6 membered heterocyclic ring in which Z is nitrogen, substituted nitrogen, oxygen or sulfur, and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amid, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, sulphonic acid as halide, and may be the same or different or R.sub.1 taken together with R.sub.2 is methylenedioxy.
Claims12
A photosensitive polymer composition comprising a compound of the structure ##STR24## wherein ##STR25## is a polyvinyl acetal, n is an integer from 1 to 6,
- R is hydrogen or alkyl,
- m is an integer from 1 to 6,
- X is an anion, ##STR26## is a divalent radical having the structure ##STR27## Y is a monovalent radical having the structure ##STR28## and more particularly, Y=phenyl and naphthyl unsubstituted or substituted with hydrogen, alkyl, alkenyl, alkoxy, aralkyl, and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are hydrogen, alkyl, alkenyl, alkoxy, aralkyl, substituted alkyl, substituted alkoxy, carboxy, carboxy ester, amino, substituted amino, amido, substituted amido, cyano, hydroxy, nitro, isocyanato, sulphonyl halide, and may be the same or different, or R.sub.1 taken together with R.sub.2 is methylenedioxy.
Dependencies are inferred from the claim text.