Surface tension sulfuric acid composition
AssigneesKanto Kagaku Kabushiki Kaisha, Nissan Chemical Industries, Ltd.
InventorsKiyoto Mori, Takao Shihoya, Hisao Hara, deceased
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Abstract
Sulfuric acid or sulfuric acid/hydrogen peroxide cleaning solutions used in semiconductor manufacturing processes are improved in wettability and cleaning effect by lowering their surface tension through the addition of surface-active agents Of the general formula R.sup.1 SO.sub.2 NR.sup.2 C.sub.2 H.sub.4 OA(I) wherein R.sup.1 stands for a fluoroalkyl group, R.sup.2 for H or a lower alkyl group and A for H or SO.sub.3 H.
Claims5
A low surface tension sulfuric acid composition comprising sulfuric acid and a fluorine-type surface-active agent comprising a fluoroalkylsulfonamide compound of the general formula
- R.sup.1 SO.sub.2 NR.sup.2 C.sub.2 H.sub.4 OA (I)
- wherein R.sup.1 stands for a fluoroalkyl group, R.sup.2 for a hydrogen atom or a lower alkyl group and A for H or SO.sup.3 H.
Dependencies are inferred from the claim text.