Method of forming electrodeposited anti-reflective surface coatings
AssigneeMartin Marietta Corporation
InventorDarell E. Engelhaupt
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Abstract
A method is disclosed for the production of highly diffusive or absorptive metal surfaces. A dendritic crystal structure surface layer of metal is electrodeposited on a substrate, using a bipolar pulse plating technique. This metal surface layer may then be oxidized to provide a highly anti-reflective surface.
Claims15
A method for application of a high specific area, anti-reflective surface to a substrate, said method comprising electrodepositing, by a bipolar pulse plating method which encompasses alternate plating and etching, a surface layer of metal exhibiting a dendritic crystal structure, and contacting said surface layer with an oxidizing solution to form an oxide layer on said surface layer to thereby form said anti-reflective surface.
A method for preparation of a highly diffusive surface on a conductive substrate, said method comprising electrolytically depositing with direct current a relatively smooth foundation layer of a metal selected from the group consisting of copper, nickel, gold, silver, iron, cobalt, and cadmium, depositing by bipolar pulse plating encompassing alternate plating and etching, from the same electrolytic composition, a redundant dendritic pattern of crystals of the same metal, and contacting the surface of said crystals with an oxidizing solution to form an oxide layer on said crystals to thereby form said highly diffusive surface.
Dependencies are inferred from the claim text.