Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsRyuichi Ebinuma, Nobutoshi Mizusawa, Takao Kariya, Shigeyuki Suda, Shunichi Uzawa, Takayuki Hasegawa
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Abstract
An exposure apparatus and method for exposing a workpiece to a pattern of an original with radiation includes a masking device having movable blades for variably defining an aperture to selectively block and transmit the radiation to define on the workpiece a desired exposure zone corresponding to the aperture, the masking device having a window, and a detector for detecting the positional deviation between the original and the workpiece by using light passing through the window of the masking device.
Claims22
An exposure apparatus for exposing a workpiece to a pattern of an original with X-rays, said apparatus comprising:
- a masking device having a movable blade for variably defining an aperture to selectively block and transmit the X-rays to define on the workpiece a desired exposure zone corresponding to said aperture, said movable blade having a window;
- and
- detecting means comprising a source of alignment light for detecting a positional relationship between the original and the workpiece by using alignment light having a wavelength longer than the X-rays passing through said window of said movable blade, wherein said source of alignment light is displaced with said movable blade.
An exposure method for exposing a workpiece to a pattern of an original with X-rays, said method comprising the steps of:
- providing a masking device having a movable blade for variably defining an aperture to selectively block and transmit the X-rays to define on the workpiece a desired exposure zone corresponding to the aperture, wherein said movable blade has a window;
- positioning the movable blade to set the aperture to be used for the exposure of the workpiece;
- detecting a positional relationship between the original and the workpiece by using alignment light having a wavelength longer than the X-rays passing through the window of the movable blade, wherein a source of the alignment light is displaced with the movable blade;
- and
- exposing a zone of the workpiece corresponding to the set aperture of the masking device with the X-rays passing through the set aperture.
An exposure apparatus for exposing a workpiece to a pattern of an original with X-rays, said apparatus comprising:
- a masking device having a movable blade for variably defining an aperture to selectively block and transmit the X-rays to define on the workpiece a desire exposure zone corresponding to the aperture, said movable blade having a window;
- a light source for providing alignment light having a wavelength longer than the X-rays, for detection of a positional relationship between the original and the workpiece, wherein said source of alignment light is displaced with said movable blade;
- and
- a detector for receiving the alignment light provided by said light source and passing through said window of said movable blade, to detect the positional relationship between the original and the workpiece;
- wherein said movable blade is disposed between the workpiece and said detector with respect to a path of the X-rays.
A method of manufacturing semiconductor devices by exposing a workpiece to a pattern of an original with X-rays, said method comprising the steps of:
- providing a masking device having a movable blade for variably defining an aperture to selectively block and transmit the X-rays to define on the workpiece a desired exposure zone corresponding to the aperture, wherein the movable blade has a window;
- positioning the movable blade to set the aperture to be used for the exposure of the workpiece;
- detecting a positional deviation between the original and the workpiece by using alignment light having a wavelength longer than the X-rays, passing through the window of the movable blade, wherein a source of the alignment light is displaced with the movable blade;
- and
- exposing a zone of the workpiece corresponding to the set aperture of the masking device, with the X-rays passed through the set aperture.
Dependencies are inferred from the claim text.