Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member

A method of manufacturing an electrophotographic photosensitive member having a metal substrate provided thereon with at least a photoconductive layer, by a process comprising the steps of;

• a) cutting the surface of said substrate to remove the surface in the desired thickness;
• b) bringing the cut surface of said substrate into contact with water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11M .OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.M in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes at a pressure of from 1 kg.multidot.f/cm.sup.2 to 300 kg.multidot.f/cm.sup.2 ;
• and
• c) forming said photoconductive layer on the substrate having been subjected to the step of bringing the cut surface into said water.

A method of manufacturing an electrophotographic photosensitive member by a process comprising the steps of:

• (a) cutting the surface of a metal substrate in a given precision;
• (b) cleaning the cut surface of said substrate with water;
• (c) bringing the cleaned surface of said substrate into contact with pure water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11M .OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes to clean the surface;
• and
• (d) forming on the cleaned substrate surface by plasma CVD a light receiving layer comprising a photoconductive layer and a surface layer each comprising a non-monocrystalline material mainly composed of a silicon atom such that said photoconductive layer contains carbon atoms and hydrogen atoms throughout the layer and said carbon atoms being distributed in a non-uniform content in the layer thickness direction and in a higher content at its surface on the side of said metal substrate and such that said surface layer contains carbon atoms and hydrogen atoms.