Process for forming a mixed layer of a plasma sprayed material and diamond
AssigneeFujitsu Limited
InventorsKazuaki Kurihara, Motonobu Kawarada, Ken-ichi Sasaki, Akitomo Teshima
Life of this patent
Estimating the term…
Abstract
A process for forming a diamond gas phase synthesized coating film which is easily controlled and affords a high quality, good adhesion strength diamond film includes a step of forming a mixed layer of a plasma spraying material and diamond by simultaneously conducting plasma injection by a plasma spraying, a first torch and plasma CVD by a CVD plasma, second torch to thereby form a mixed layer on the substrate. The first and second torches are structurally distinct and have respective, separately and selectively controlled plasma generation operating conditions.
Claims4
A process for the production of a coating film having a mixed layer of a plasma spraying material and diamond, the process using a plasma spraying first torch and a plasma CVD second torch, the first and second torches being structurally distinct and having respective, separately controlled plasma generation operating conditions, and comprising simultaneously conducting plasma spraying of the plasma spraying material using an inert gas as a plasma forming gas by the plasma spraying torch, and plasma CVD of a diamond forming material using hydrogen gas and hydrocarbon gas by the CVD plasma torch, thereby to form said mixed layer on a substrate.
Dependencies are inferred from the claim text.