Method and apparatus for single crystal silicon production
OwnerJohn C. Lim, William A. Kochinventors
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OwnerJohn C. Lim, William A. Kochinventors
Estimating the term…
There is disclosed a method for growing single crystal material, particularly silicon, in modified Czochralski process furnaces and chambers. The Czochralski process equipment is modified to permit continuous addition of polycrystalline material, preferably in dry powdered form to a molten bath of the material that is maintained at a constant shallow depth. For this purpose, a circular baffle is placed within the crucible containing the molten bath of the material, dividing the crucible into an annular feed zone and a central crystal growth zone. A cylindrical boule is withdrawn from the central crystal growth zone. The surrounding walls of the crucible, and graphite cup that supports the crucible, provide a heating and annealing zone in which the boule is continuously annealed as it is withdrawn from the molten pool. Dopants are also introduced into the annular feed zone, either separately or admixed with the polycrystalline material.
An apparatus suitable for single crystal boule manufacture from a shallow, molten pool of silicon material which comprises:
In a Czochralski process furnace and vacuum chamber wherein a housing is provided with evacuation means to maintain its interior as a vacuum chamber and said housing has a centrally located cylindrical furnace which surrounds a crucible nested within a graphite cup which are mounted on a platform supported on a central shaft for rotational movement, and wherein said housing also has a communicating boule withdrawal chamber extending vertically axially therefrom, the improvement which comprises:
Dependencies are inferred from the claim text.