Pattern data processing device for sewing machine

A pattern data processing device for a sewing machine for processing signals representative of composite-pattern data of a desired composite-pattern in which a desired unit-pattern is placed at a predetermined position relative to a reference-pattern, the signals representative of the composite-pattern data being adapted for controlling the sewing machine to stitch, on a cloth, a stitch pattern corresponding to the desired composite-pattern, the pattern data processing device comprising:

• unit-pattern storing means for storing signals representative of a plurality of unit-pattern data of a plurality of unit-patterns, each of the plurality of unit-pattern data including information on relative movement between a sewing needle of a sewing machine and a cloth required to attain a stitch pattern of the corresponding unit-pattern;
• reference-pattern storing means for storing signals representative of reference-pattern data of a reference-pattern and position data for the reference-pattern, the reference-pattern data including information on relative movement between the sewing needle of the sewing machine and the cloth required to attain a stitch pattern of the reference-pattern, the position data being indicative of a predetermined position at which the unit-pattern is to be placed relative to the reference-pattern;
• unit-pattern selecting means for selecting signals representative of unit-pattern data of a desired unit-pattern out of said unit-pattern storing means;
• calculating means for synthesizing signals representative of the selected unit-pattern and the reference-pattern, on the basis of the signals representative of the unit-pattern data selected by said unit-pattern selecting means, the signals representative of the reference-pattern data and the position data, to thereby obtain signals representative of a composite-pattern in which the selected unit-pattern is placed at the predetermined position relative to the reference-pattern, and for calculating signals representative of composite-pattern data of the composite-pattern, the composite-pattern data including information on relative movement between the sewing needle of the sewing machine and the cloth required to attain a stitch pattern of the composite-pattern;
• and
• output means for outputting the signals representative of the composite-pattern data to the sewing machine, to thereby control the sewing machine to stitch, on the cloth, a stitch pattern corresponding to the composite-pattern in which the selected unit-pattern is placed at the predetermined position relative to the reference-pattern.

A sewing machine for stitching, on a cloth, a desired composite-pattern in which a desired unit-pattern is placed at a predetermined position relative to a reference-pattern, the sewing machine comprising:

• unit-pattern storing means for storing a plurality of unit-pattern data of a plurality of unit-patterns;
• reference-pattern storing means for storing reference-pattern data of a reference-pattern and position data for the reference-pattern, the position data being indicative of a predetermined position at which the unit-pattern is to be placed relative to the reference-pattern;
• unit-pattern selecting means for selecting unit-pattern data of a desired unit-pattern out of said unit-pattern storing means;
• calculating means for synthesizing the selected unit-pattern and the reference-pattern, on the basis of the unit-pattern data selected by said unit-pattern selecting means, the reference-pattern data and the position data, to thereby obtain a composite-pattern in which the selected unit-pattern is placed at the predetermined position relative to the reference-pattern and for calculating composite-pattern data of the composite-pattern;
• stitch forming means for forming stitches on a cloth in accordance with the composite-pattern data, to thereby form a stitch pattern corresponding to the composite-pattern in which the selected unit-pattern is placed at the predetermined position relative to the reference-pattern.