Wholly aromatic polyamide resin composition having enhanced light resistance
AssigneeTeijin Limited
InventorsToshitsugu Matsuki, Tsutomu Kiriyama, Toshihiro Santa
Life of this patent
Estimating the term…
Abstract
A light-resistant wholly aromatic polyamide resin composition comprises a light-resisting agent blended to a wholly aromatic polyamide resin and comprising at least one naphthalene ring structure-containing compound of the formula (I): ##STR1## wherein Ar.sub.1, Ar.sub.2, Ar.sub.3 =a divalent organic group, X=an amide bond group (--CONH), Y=an amide bond group or an imide bond group ##STR2## A and B=a monovalent organic group when Y=an amide bond group, or =a divalent organic group when Y=an imide bond group, n=1 to 10, and at least one of Ar.sub.1, Ar.sub.2, Ar.sub.3, A and B has a naphthalene ring structure.
Claims10
A wholly aromatic polyamide resin composition comprising:
- a matrix consisting essentially of a wholly aromatic polyamide resin;
- and
- a light-resisting agent blended to the wholly aromatic polyamide resin matrix and comprising at least one naphthalene ring structure-containing compound of the formula (I):
- ##STR15## wherein Ar.sub.1, Ar.sub.2 and Ar.sub.3 respectively and independently from each other represent a divalent organic group, X represents an amide bond group of the formula --CONH--, Y represents a member selected from the group consisting of an amide bond group of the --CONH-- formula and an imide bond group of the formula of ##STR16## A and B respectively and independently from each other a monovalent organic group when Y represents the amide bond group and a divalent organic group when Y represents the imide bond group;
- n represents an integer of from 1 to 10, and at least one of Ar.sub.1, Ar.sub.2, Ar.sub.3, A and B has a naphthalene ring structure.
Dependencies are inferred from the claim text.