Method of producing a transparent conductive film provided with supplementary metal lines
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsOsamu Yamamoto, Kouji Nishimura, Akira Isomi, Masahide Tsukamoto
Life of this patent
Estimating the term…
Abstract
A method of producing a transparent conductive film provided with supplementary metal lines, comprises the steps of forming a transparent conductive film composed mainly of indium oxide, tin oxide, or antimony oxide on a transparent substrate and forming metal lines through printing on the transparent conductive film by an intaglio or litho offset printing procedure a line pattern of metallorganic ink composed mainly of an organic noble metal containing gold, silver, or platinum and baking it for metallization.
Claims6
A method of producing a transparent conductive film provided with an auxiliary metal electrode, comprising the steps of:
- forming a transparent conductive film composed mainly of a metal oxide selected from the group consisting of indium oxide, tin oxide and antimony oxide on a transparent substrate;
- printing a pattern of metallorganic ink composed mainly of an organic noble metal compound on the transparent conductive film by an intaglio offset printing method using an intaglio which is made of a mono-crystal silicon wafer or silica glass plate on which a pattern of grooves have been formed by dry etching, the pattern of grooves having a width of 10 .mu.m or less and a depth of 10 .mu.m or more;
- and
- baking for metallizing the pattern of metallorganic ink to obtain an auxiliary metal electrode composed mainly of noble metal on the transparent conductive film, the auxiliary metal electrode having a width of 10 .mu.m or less.
Dependencies are inferred from the claim text.