Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray

A reflection mirror, for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon nitride.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise boron carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said first layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium boride and said second layers comprise silicon oxide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise beryllium.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise boron carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon nitride.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tantalum nitride and said second layers comprise silicon oxide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise beryllium.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise boron carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon nitride.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise ruthenium and said second layers comprise silicon oxide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten and said second layers comprise beryllium.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise boron carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon nitride.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise tungsten carbide and said second layers comprise silicon oxide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise beryllium.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise boron carbide.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon nitride.

A reflection mirror for soft X-ray to vacuum ultraviolet ray, comprising:

• a substrate, wherein said substrate has a planar surface polished to have a surface roughness of 10 .ANG. (rms) or less;
• and
• a multi-layer film formed on said substrate, said multi-layer film having a plurality of first layers and a plurality of second layers, each of said second layers being alternately layered to each of said first layers on said substrate, wherein said first layers comprise hafnium nitride and said second layers comprise silicon oxide.