Semiconductor strained SL APD apparatus
AssigneeHitachi, Ltd.
InventorsShinji Tsuji, Hitoshi Nakamura
Life of this patent
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Abstract
By making the lattice constant of barrier layers of a superlattice avalanche photodiode lower than the lattice constant of well layers to apply a tensile stress to the barrier layers, a high gain-bandwidth product can be obtained with a high ionization rate ratio kept.
Claims7
An avalanche photodiode having a multiplication layer, a light absorbing layer and a crystalline substrate, said multiplication layer comprising superlattice layers having a structure in which at least two types of semiconductors with different band gaps are laminated, wherein a tensile stress is applied to barrier layers among said superlattice layers.
An avalanche photodiode wherein a first buffer layer, a multiplication layer, an electric field relaxation layer, a light absorbing layer, a second buffer layer, and a contact layer are laminated on a crystalline substrate in this order, and said multiplication layer comprises superlattice layers having a structure in which at least two types of semiconductors with different band gaps are laminated, and a lattice constant of barrier layers of said superlattice layers is smaller than a lattice constant of the crystalline substrate by 0.1% to 3.5%, and the difference between a mean lattice constant of said multiplication layer and the lattice constant of the crystalline substrate is not more than 0.2%.
A front end receiver in a light transmission system comprising a transmitter and a receiver, wherein the front end of said receiver has an avalanche photodiode which has a multiplication layer and a light absorbing layer, said multiplication layer comprising superlattice layers having a structure in which at least two types of semiconductors with different band gaps are laminated, and wherein a tensile stress is applied to barrier layers among said superlattice layers.
Dependencies are inferred from the claim text.