Alignment check pattern for multi-level interconnection
AssigneeNEC Corporation
InventorTakenori Morikawa
Life of this patent
Estimating the term…
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AssigneeNEC Corporation
InventorTakenori Morikawa
Estimating the term…
An alignment check pattern formed by a first insulating film; a first dummy pattern formed on a surface of said first insulating film; a second insulating film formed on a composite surface of said first insulating film and said first dummy pattern; a second dummy pattern formed on said second film, and positioned directly over said first dummy pattern in plan view; a third insulating film formed on a composite surface of said second insulating film and said second dummy pattern; a regular scale pattern formed on said third insulating film, and positioned directly over said second dummy pattern; fourth insulating film formed on a composite surface of said third insulating film and said regular scale pattern; and a vernier scale pattern formed on a surface of said fourth insulating film and positioned directly over said regular scale pattern.
An alignment check pattern used for a multi-level interconnection having a first level wiring formed on a major surface of a first insulating film, a second insulating film formed to cover said major surface of said first insulating film and a surface of said first level wiring, a second level wiring formed on a surface of said second insulating film, and a third insulating film formed to cover a surface of said second insulating film and a surface of said second level wiring, said alignment check pattern comprising:
An alignment check pattern used for a multi-level interconnection having a first level wiring formed on a major surface of a first insulating film, a second insulating film formed to cover said major surface of said first insulating film and a surface of said first level wiring, a second level wiring formed on a surface of said second insulating film, a third insulating film formed to cover a surface of said second insulating film and a surface of said second level wiring, a third level wiring formed on a surface of said third insulating film, and a fourth insulating film formed to cover a surface of said third insulating film and a surface of said third level wiring, said alignment check pattern comprising:
An alignment check pattern comprising:
An alignment check pattern comprising:
Dependencies are inferred from the claim text.