Method for the preparation of a resin membrane
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsMeguru Kashida, Yoshihiro Kubota, Yoshihiko Nagata, Hitoshi Noguchi
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Abstract
A method is proposed for the preparation of a resin membrane suitable for use, for example, as a covering pellicle of a photolithographic mask for patterning of semiconductor devices in the electronic industry. The method comprises the steps of: (a) coating a continuous-length substrate with a solution of the resin by using a roller coater to form a coating layer of the resin solution; (b) drying the coating layer by evaporating the solvent to form a dry resin film on the substrate surface; and (c) peeling the resin film from the surface of the substrate, preferably, in water.
Claims8
A method for the preparation of a membrane of a fluorocarbon resin as a pellicle for a photolithographic mask which comprises the successive steps of:
- (a) coating the surface of a substrate with a solution of a fluorocarbon resin having film-formability in a solvent by using a roller coater to form a layer of the resin solution;
- (b) evaporating the solvent from the coating layer of the resin solution to form a dry film of the resin on the substrate surface;
- and
- (c) peeling the resin film from the substrate surface.
Dependencies are inferred from the claim text.