Method and apparatus for direct use of low pressure vapor from liquid or solid precursors for selected area laser deposition

A method of depositing a layer of material onto a substrate, comprising:

• providing a substrate having a surface layer;
• preparing a catalytic composition upon at least a portion of said surface layer;
• positioning a gas phase at an ambient temperature proximate to said substrate, said gas phase comprising at least one gas phase component which condenses at a temperature above said ambient temperature;
• scanning an energy beam across said surface layer;
• and
• depositing material from said gas phase onto said surface layer at predetermined scanned locations of said beam in quantity according to said catalytic composition.

A method of depositing a layer of material, comprising:

• providing a part having an outer layer;
• positioning a gas phase at an ambient temperature proximate said outer layer, said gas phase comprising at least one gas phase component which condenses at a temperature above ambient temperature;
• introducing a predetermined concentration of a catalyst gas into said gas phase;
• scanning an energy beam across said outer layer;
• and
• depositing material from said gas phase onto said outer layer at predetermined scanned locations of said beam in accordance with said catalytic gas concentration within said gas phase.

A method of producing a part upon a substrate, comprising:

• providing a sealable chamber;
• placing a substrate within said sealable chamber, said substrate having an outer surface layer;
• preparing a catalytic composition upon a portion of said surface layer;
• introducing a gas phase at an ambient temperature into said sealable chamber and proximate said surface layer, said gas phase comprising at least one gas phase component which condenses at a temperature above ambient temperature;
• scanning an energy beam across said surface layer;
• depositing material from said gas phase onto said surface layer in a three dimensional growth pattern at predetermined scanned locations of said beam at rates consistent with said catalytic composition concentration;
• introducing a predetermined concentration of a catalyst gas phase component into said sealable chamber and within said gas phase;
• scanning said energy beam across said surface layer;
• depositing material from said gas phase onto said surface layer in a three dimensional growth pattern at predetermined scanned locations of said beam at rates consistent with said catalyst gas concentration;
• and
• repeating the last two steps to deposit successive layers of materials comprising said part.

An apparatus for producing a part, comprising:

• a chamber at an ambient temperature containing at least one gas phase component which condenses at a temperature above said ambient temperature;
• a target area within said chamber;
• a catalyst formed upon said target area;
• and
• at least one energy beam directed upon said target area to selectively nucleate and renucleate said at least one gas phase component influenced by said catalyst upon said target area to form a part.

A method of depositing a layer of material on a target area, the method comprising:

• positioning a gas phase at an ambient temperature proximate to the target area, said gas phase comprising at least one gas phase component which condenses at a temperature above ambient temperature;
• scanning an energy beam across the target area;
• and
• depositing material from said gas phase onto the target area at predetermined scanned locations of said beam upon the target area.

A method of depositing a layer of material onto a substrate, comprising:

• providing a substrate having a surface layer;
• positioning a gas phase at an ambient temperature proximate to said substrate, said gas phase comprising at least one gas phase component which condenses at a temperature above said ambient temperature;
• scanning an energy beam across said surface layer;
• and
• depositing material from said gas phase onto said surface layer at predetermined scanned locations of said beam.

A method of depositing a layer of material, comprising:

• providing a part having an outer layer;
• positioning a gas phase at an ambient temperature proximate said outer layer, said gas phase comprising at least one gas phase component which condenses at a temperature above ambient temperature;
• scanning an energy beam across said outer layer;
• and
• depositing material from said gas phase component onto said outer layer at predetermined scanned locations of said beam.

A method of producing a part upon a substrate, comprising:

• providing a sealable chamber;
• placing a substrate within said sealable chamber, said substrate having an outer surface layer;
• introducing a gas phase at ambient temperature into said sealable chamber and proximate said surface layer, said gas phase comprising at least one gas phase component which condenses at a temperature above said ambient temperature;
• scanning an energy beam across said surface layer;
• depositing material from said gas phase component onto said surface layer in a three dimensional growth pattern at predetermined scanned locations of said beam;
• and
• repeating the introducing, scanning and depositing steps to deposit successive layers of materials comprising said part.

An apparatus for producing a part, comprising:

• a gas-filled chamber at an ambient temperature, said gas comprising at least one gas phase component which condenses above said ambient temperature;
• a target area within said chamber;
• and
• at least one energy beam directed upon said target area to selectively nucleate and renucleate said gas phase component.